SCHEMBL2746691

SCHEMBL2746691

Nc1ccc(Oc2ccc(C#CC34CC5CC(CC(C5)C3)C4)c(Oc3ccc(N)c(O)c3)c2)cc1O

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 1/20 0.37
MMP14 P50281 1/20 0.37
GAA P10253 2/20 0.33
MAPT P10636 2/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
THRB P10828 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33
ALOX12 P18054 1/20 0.33
HTT P42858 1/20 0.33
KMT2A Q03164 1/20 0.33
HSD17B10 Q99714 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
XBP1 P17861 1/20 0.32
NR4A1 P22736 1/20 0.31
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2748555 0.92 MMP2 (0.36) MMP2MMP14GAAMAPTKDM4E
SCHEMBL2747820 0.86 MMP2 (0.33) MMP2MMP14GAAMAPTKDM4E
SCHEMBL2746863 0.83 GAA (0.30) GAA
SCHEMBL2747065 0.79 MMP2 (0.31) MMP2MMP14
SCHEMBL2746860 0.79 GAA (0.31) MMP2MMP14GAAMAPTKDM4E
SCHEMBL2747518 0.76 MMP2 (0.34) MMP2MMP14MEN1ALDH1A1KMT2A
SCHEMBL2749941 0.74 NR4A1 (0.40) MMP2MMP14GAAMAPTKDM4E
SCHEMBL2707709 0.74 MEN1 (0.38) MMP2MMP14GAAMAPTKDM4E
SCHEMBL5086572 0.73 MEN1 (0.50) MMP2MMP14GAAMEN1ALDH1A1
SCHEMBL2746914 0.72 MAPT (0.42) MMP2MMP14GAAMAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed