SCHEMBL2748044

SCHEMBL2748044

Nc1ccc(Oc2ccc(C3(c4ccc(Oc5ccc(N)c(O)c5)cc4)c4ccccc4-c4ccccc43)cc2)cc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 6/20 0.50
KMT2A Q03164 6/20 0.50
MAPT P10636 4/20 0.50
KDM4E B2RXH2 3/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
LMNA P02545 1/20 0.50
OPRK1 P41145 1/20 0.50
ESR1 P03372 2/20 0.47
ESR2 Q92731 2/20 0.47
PDK2 Q15119 1/20 0.42
MMP2 P08253 1/20 0.39
MMP14 P50281 1/20 0.39
NR4A1 P22736 1/20 0.37
LTA4H P09960 1/20 0.36
NR1H2 P55055 1/20 0.36
BAX Q07812 1/20 0.36
ALOX15 P16050 2/20 0.35
TSHR P16473 1/20 0.35
POLB P06746 2/20 0.35
GAA P10253 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5038739 0.90 MEN1 (0.51) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL31544678 0.90 MEN1 (0.51) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL29133183 0.88 MEN1 (0.40) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL14354879 0.86 MEN1 (0.38) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL16429104 0.83 ESR1 (0.56) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL16902923 0.83 LTA4H (0.53) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL3629040 0.83 LTA4H (0.53) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL22651766 0.83 LTA4H (0.53) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL4240467 0.83 ESR1 (0.60) MEN1KMT2AMAPTKDM4ESMN1; SMN2
SCHEMBL2450327 0.83 SMN1; SMN2 (0.50) MEN1KMT2AMAPTKDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9321017-B2 Gas-separation membrane NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (JP) 2016-04-26 US claimed
US-20150033945-A1 GAS-SEPARATION MEMBRANE NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (JP) 2015-02-05 US claimed
US-9321017-B2 Gas-separation membrane NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (JP) 2016-04-26 US disclosed
US-20160053116-A1 POLYMER SOLUTION, POLYMER FILM, STACKED COMPOSITE, DISPLAY ELEMENT, OPTICAL ELEMENT, ILLUMINATION ELEMENT, AND PRODUCTION METHOD THEREFOR SUMITOMO BAKELITE CO., LTD. (JP) 2016-02-25 US disclosed
US-20150033945-A1 GAS-SEPARATION MEMBRANE NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (JP) 2015-02-05 US disclosed
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-7608928-B2 Laminated body and semiconductor device JSR CORPORATION (JP) 2009-10-27 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
US-7416822-B2 Resin and resin composition ASAHI KASEI EMD CORPORATION (JP) 2008-08-26 US disclosed
EP-1189974-B1 POLYBENZOXAZOLE PRECURSORS INFINEON TECHNOLOGIES AG (DE) 2003-05-21 EP disclosed
US-6531632-B2 Reacting dihydroxy compound with halogenated o-nitrophenol INFINEON TECHNOLOGIES AG (DE) 2003-03-11 US disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020086968-A1 Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor POLARIS INNOVATIONS LIMITED (IE) 2002-07-04 US disclosed
US-6380271-B1 MIXING A POLYBENZOXAZOLE PRECURSOR OR A POLYBENZOXAZOLE RESIN WITH AN OLIGOMER, FORMING FILM FROM RESULTING MIXTURE, HEATING FILM IN NITROGEN CONTAINING OXYGEN TO GIVE RISE TO THERMAL DECOMPOSITION AND GASIFICATION OF OLIGOMER TO FORM RESIN LAYER SUMITOMO BAKELITE COMPANY LIMITED (JP) 2002-04-30 US disclosed
EP-1189974-A1 POLYBENZOXAZOLE PRECURSORS Infineon Technologies AG (DE) 2002-03-27 EP disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed
US-20020010370-A1 Bis-o-aminophenols and o-aminophenolcarboxylic acids and process for preparing the same POLARIS INNOVATIONS LIMITED (IE) 2002-01-24 US disclosed
WO-2001066619-A1 POLYBENZOXAZOLE PRECURSORS INFINEON TECHNOLOGIES AG (DE) 2001-09-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020010370-A1 Bis-o-aminophenols and o-aminophenolcarboxylic acids and process for preparing the same FOS, POF1B, FOSB MEN1 3903/4885KMT2A 1691/4885MAPT 2308/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.