SCHEMBL2748060

SCHEMBL2748060

O=C(O)c1ccc(-c2ccccc2)c(-c2ccccc2-c2ccccc2)c1C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HNF4A P41235 2/20 0.53
FABP3 P05413 1/20 0.45
FABP4 P15090 1/20 0.45
FABP5 Q01469 1/20 0.45
BCAT2 O15382 1/20 0.43
ALDH1A1 P00352 4/20 0.42
MAPT P10636 3/20 0.42
KMT2A Q03164 3/20 0.42
FOLH1 Q04609 2/20 0.42
MEN1 O00255 2/20 0.42
LMNA P02545 2/20 0.42
MAPK1 P28482 2/20 0.42
POLB P06746 1/20 0.42
THRB P10828 1/20 0.42
RECQL P46063 1/20 0.42
PTPN1 P18031 1/20 0.42
CDC25B P30305 1/20 0.41
ATM Q13315 1/20 0.41
ACMSD Q8TDX5 1/20 0.41
ALOX15 P16050 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2904584 0.90 HNF4A (0.59) HNF4AFABP3FABP4FABP5BCAT2
SCHEMBL21486 0.89 HNF4A (0.52) HNF4AFABP3FABP4FABP5BCAT2
SCHEMBL87698 0.87 MAPT (0.52) HNF4AALDH1A1MAPTKMT2AFOLH1
SCHEMBL7458970 0.87 HNF4A (0.56) HNF4AFABP3FABP4FABP5BCAT2
Hydrochloric Acid SCHEMBL4002701 0.85 MAPT (0.50) HNF4AALDH1A1MAPTKMT2AFOLH1
SCHEMBL28233125 0.85 HNF4A (0.52) HNF4AFABP3FABP4FABP5BCAT2
Hydrochloric Acid SCHEMBL11418766 0.85 MAPT (0.50) HNF4AALDH1A1MAPTKMT2AFOLH1
SCHEMBL27024028 0.83 HNF4A (0.48) HNF4AFABP3FABP4FABP5ALDH1A1
Biphenyl SCHEMBL11750014 0.83 HNF4A (0.54) HNF4AFABP3FABP4FABP5BCAT2
SCHEMBL27718219 0.81 HNF4A (0.61) HNF4AFABP3FABP4FABP5ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-7608928-B2 Laminated body and semiconductor device JSR CORPORATION (JP) 2009-10-27 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
US-20080044664-A1 Laminated Body and Semiconductor Drive JSR CORPORATION (JP) 2008-02-21 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed
EP-1760774-A1 LAMINATED BODY AND SEMICONDUCTOR DEVICE JSR Corporation (JP) 2007-03-07 EP disclosed