Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL203518 | 0.93 | ALDH1A1 (0.44) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| SCHEMBL20680488 | 0.90 | ALDH1A1 (0.41) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| Fluoromethane SCHEMBL28191693 | 0.87 | ALDH1A1 (0.39) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| SCHEMBL28253061 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| Ethylene SCHEMBL28734103 | 0.85 | ALDH1A1 (0.40) | ALDH1A1TSHRHSD17B10TDP1 | |
| Dimethylamine SCHEMBL5389239 | 0.84 | ALDH1A1 (0.44) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| Tetramethylammonium Ion SCHEMBL5398916 | 0.84 | ALDH1A1 (0.37) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| Trimethylammonium SCHEMBL5391194 | 0.84 | ALDH1A1 (0.37) | ALDH1A1TSHRHSD17B10TDP1LMNA | |
| Methacrylic Acid SCHEMBL28675559 | 0.83 | TDP1 (0.38) | ALDH1A1TSHRHSD17B10TDP1 | |
| Acrylic Acid SCHEMBL29989543 | 0.81 | LMNA (0.50) | ALDH1A1TSHRHSD17B10TDP1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118276408-A | Photosensitive resin composition, photo-cured pattern formed thereby, and display device including photo-cured pattern | 东友精细化工有限公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-106468857-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2019-10-15 | — | — | CN | disclosed |
| CN-110007563-A | Negative photosensitive resin constituent, clearance body, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2019-07-12 | — | — | CN | disclosed |
| CN-109791222-A | Transparent substrate having anti-glare and anti-reflection properties and method for manufacturing same | 福美化学工业株式会社 | 2019-05-21 | — | — | CN | disclosed |
| CN-107544208-A | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-107544210-A | Negative photosensitive resin composition, method for producing spacer, method for producing protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-103901728-B | Photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-06-06 | — | — | CN | disclosed |
| CN-106468857-A | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2017-03-01 | — | — | CN | disclosed |
| CN-106338888-A | Photosensitive resin composition, protective film and element | 奇美实业股份有限公司 | 2017-01-18 | — | — | CN | disclosed |
| CN-103728833-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-102149763-A | Use of silicon-containing precursor compounds of an organic acid as a catalyst for cross-linking filled and unfilled polymer compounds | EVONIK DEGUSSA GMBH | 2011-08-10 | — | — | CN | disclosed |
| CN-101321799-B | Liquid resin composition for electronic element and electronic element device | HITACHI CHEMICAL CO LTD | 2011-06-15 | — | — | CN | disclosed |
| CN-101326454-B | Method for manufacturing polarizing plate, polarizing plate and liquid crystal display device | KONICA MINOLTA OPTO INC | 2010-11-03 | — | — | CN | disclosed |
| CN-101609256-A | Diaphragm forms the formation method with radiation sensitive linear resin composition and diaphragm | JSR CORP (JP) | 2009-12-23 | — | — | CN | disclosed |
| CN-101326454-A | Method for manufacturing polarizing plate, polarizing plate and liquid crystal display device | KONICA MINOLTA OPTO INC (JP) | 2008-12-17 | — | — | CN | disclosed |
| CN-101321799-A | Liquid resin composition for electronic element and electronic element device | HITACHI CHEMICAL CO LTD (JP) | 2008-12-10 | — | — | CN | disclosed |
| CN-100388126-C | Carrier for electrophotography | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2008-05-14 | — | — | CN | disclosed |
| CN-1688941-A | Carrier for electrophotography | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-10-26 | — | — | CN | disclosed |
| CN-1163641-C | High light resistant polymer for fiber and high light resistant fiber and its preparation | 株式会社日本触媒 | 2004-08-25 | — | — | CN | disclosed |
| CN-1280214-A | High light resistant polymer for fiber and high light resistant fiber and its preparation | NIPPON CATALYTIC CHEM IND (JP) | 2001-01-17 | — | — | CN | disclosed |