SCHEMBL2749595

SCHEMBL2749595

Cc1n(C(C)O)cc[n+]1C

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ACHE P22303 2/20 0.38
HDAC8 Q9BY41 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL18152779 0.80 ACHE (0.39) ACHEHDAC8
SCHEMBL422388 0.75 ACHE (0.42) ACHEHDAC8
SCHEMBL20953975 0.67 ACHE (0.33) ACHE
Bromide SCHEMBL6699524 0.65
SCHEMBL421362 0.64 ACHE (0.51) ACHEHDAC8
SCHEMBL422097 0.62 HDAC8 (0.33) HDAC8
Fluoride Ion SCHEMBL1896291 0.62
Bromide SCHEMBL1537041 0.62
SCHEMBL28442035 0.61 LMNA (0.33) ACHEHDAC8
SCHEMBL28442029 0.61 HDAC8 (0.32) ACHEHDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12466956-B2 Electroconductive resin composition and molded article of same DENKA COMPANY LIMITED (JP) 2025-11-11 US disclosed
WO-2022009445-A9 ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED ARTICLE 三洋化成工業株式会社 2025-01-16 WO disclosed
EP-4159824-B1 ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED PRODUCT SANYO CHEMICAL IND LTD (JP) 2025-01-01 EP disclosed
CN-115768850-B Antistatic agent, antistatic resin composition and molded article 三洋化成工业株式会社 2024-07-09 CN disclosed
CN-115698220-B Antistatic agent, antistatic resin composition and molded article 三洋化成工业株式会社 2024-05-07 CN disclosed
EP-4137625-B1 ANTISTATIC AGENT SANYO CHEMICAL IND LTD (JP) 2024-03-27 EP disclosed
US-20230323001-A1 ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED ARTICLE SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2023-10-12 US disclosed
WO-2023189133-A1 CONDUCTIVE RESIN COMPOSITION デンカ株式会社 2023-10-05 WO disclosed
EP-4134397-B1 ANTISTATIC AGENT FOR THERMOPLASTIC RESINS SANYO CHEMICAL IND LTD (JP) 2023-08-30 EP disclosed
CN-115397919-B Antistatic agent for thermoplastic resin 三洋化成工业株式会社 2023-08-22 CN disclosed
US-7470738-B2 Non-aqueous absorbent and use thereof SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2008-12-30 US disclosed
US-20080316679-A1 Electrolytic Solution for Electrolytic Capacitor, and Electrolytic Capacitor Using the Same PANASONIC CORPORATION (JP) 2008-12-25 US disclosed
US-20080094777-A1 Electric double layer capacitor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-24 US disclosed
EP-1905740-A1 ELECTRIC DOUBLE LAYER CAPACITOR Sumitomo Chemical Company, Limited (JP) 2008-04-02 EP disclosed
EP-1876611-A1 ELECTRIC DOUBLE LAYER CAPACITOR Sumitomo Chemical Company, Limited (JP) 2008-01-09 EP disclosed
US-20070269987-A1 Polishing Liquid for Cmp Process and Polishing Method SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2007-11-22 US disclosed
EP-1808875-A1 ELECTROLYTE FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR UTILIZING THE SAME MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-07-18 EP disclosed
EP-1628334-A1 POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD SANYO CHEMICAL INDUSTRIES LTD. (JP) 2006-02-22 EP disclosed
US-20050136247-A1 Non-aqueous absorbent and use thereof SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2005-06-23 US disclosed
EP-1462460-A1 NON-AQUEOUS ABSORBENT AND USE THEREOF SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-29 EP disclosed