SCHEMBL27522139

SCHEMBL27522139

NCc1cc(O)c(C2CCCCC2)cc1Cc1ccc(O)c(O)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NUDT1 P36639 1/20 0.53
▸ BACE1 P56817 1/20 0.53
▸ MAPT P10636 3/20 0.46
▸ SNCA P37840 4/20 0.43
▸ CA1 P00915 1/20 0.41
▸ CA2 P00918 1/20 0.41
▸ CA4 P22748 1/20 0.41
▸ CA6 P23280 1/20 0.41
▸ HSP90AA1 P07900 1/20 0.38
▸ ERCC1 P07992 2/20 0.38
▸ ERCC4 Q92889 2/20 0.38
▸ ADRA1D P25100 4/20 0.37
▸ ADRA1A P35348 4/20 0.37
▸ ADRA1B P35368 4/20 0.37
▸ KDM4E B2RXH2 2/20 0.37
▸ ADRA2A P08913 2/20 0.37
▸ DRD2 P14416 2/20 0.37
▸ DRD1 P21728 2/20 0.37
▸ DRD4 P21917 2/20 0.37
▸ DRD5 P21918 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7182409 0.75 NUDT1 (0.71) NUDT1BACE1MAPTCA1CA2
SCHEMBL3270518 0.72 NUDT1 (0.58) NUDT1BACE1MAPTCA1CA2
SCHEMBL21067341 0.70 BACE1 (1.00) NUDT1BACE1MAPTSNCAHSP90AA1
SCHEMBL22103820 0.69 NUDT1 (0.61) NUDT1BACE1CA1CA2CA4
SCHEMBL10597858 0.69 BACE1 (0.81) NUDT1BACE1MAPTSNCAHSP90AA1
SCHEMBL4056228 0.68 NUDT1 (0.52) NUDT1BACE1MAPTCA1CA2
SCHEMBL29636450 0.68 NUDT1 (0.52) NUDT1BACE1MAPTCA1CA2
SCHEMBL3185155 0.68 NUDT1 (0.52) NUDT1BACE1MAPTCA1CA2
SCHEMBL30375450 0.68 NUDT1 (0.52) NUDT1BACE1MAPTCA1CA2
SCHEMBL7760634 0.67 NUDT1 (0.52) NUDT1BACE1MAPTHSP90AA1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1289966-C Positive photoetching gum composition and method for forming photoetching gum pattern using the same TOKYO APPLIED CHEMICAL IND CO (JP) 2006-12-13 — — CN disclosed
CN-1591185-A Positive photoetching gum composition and method for forming photoetching gum pattern using the same TOKYO APPLIED CHEMICAL IND CO (JP) 2005-03-09 — — CN disclosed
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