Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL29703345 | 0.95 | — | — | |
| SCHEMBL1713454 | 0.82 | — | — | |
| SCHEMBL6995240 | 0.80 | KMT2A (0.52) | CA1CA2CA4KMT2AALDH1A1 | |
| SCHEMBL6329621 | 0.80 | CA1 (0.33) | CA1CA2CA4KMT2AALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL7082064 | 0.78 | KMT2A (0.31) | KMT2AALDH1A1MAPT | |
| SCHEMBL11612291 | 0.76 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL29657722 | 0.75 | ALDH1A1 (0.32) | ALDH1A1MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL2800832 | 0.75 | CA1 (0.35) | CA1CA2CA4KMT2AMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL1078830 | 0.74 | CA1 (0.36) | CA1CA2CA4KMT2AMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL29563922 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110637256-B | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern forming method | 三菱瓦斯化学株式会社 | 2024-01-09 | — | — | CN | disclosed |
| EP-3382453-B1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2023-09-20 | — | — | EP | disclosed |
| CN-1288499-C | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-12-06 | — | — | CN | disclosed |
| CN-1501166-A | Radiation-sensitive resin composition | JSR株式会社 | 2004-06-02 | — | — | CN | disclosed |