Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | PLA2G2C | Q5R387 | 2/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | SPHK2 | Q9NRA0 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | TLR2 | O60603 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25832655 | 0.83 | TDP1 (0.45) | CYP3A4TDP1HTTTSHR | |
| SCHEMBL18812955 | 0.81 | HSD17B10 (0.50) | CYP1A2CYP3A4CYP2C19TDP1HSD17B10 | |
| SCHEMBL12299382 | 0.81 | TDP1 (0.43) | CYP3A4TDP1HTTTSHR | |
| SCHEMBL6398251 | 0.79 | SPHK2 (0.37) | CYP1A2CYP3A4CYP2C19HSD17B10PLA2G2C | |
| SCHEMBL26997903 | 0.79 | TSHR (0.38) | CYP1A2CYP3A4CYP2C19TDP1HSD17B10 | |
| SCHEMBL16968083 | 0.79 | ALDH1A1 (0.43) | TDP1HTTTSHR | |
| SCHEMBL15219012 | 0.77 | TSHR (0.50) | CYP3A4TDP1HTTTSHR | |
| SCHEMBL16968094 | 0.77 | TSHR (0.39) | CYP1A2CYP3A4CYP2C19TDP1HSD17B10 | |
| SCHEMBL27538553 | 0.77 | TDP1 (0.39) | TDP1TSHR | |
| SCHEMBL12299381 | 0.76 | TDP1 (0.43) | TDP1HTTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101631832-A | Photocurable compositions for preparing ABS-like articles | HUNTSMAN ADV MAT SWITZERLAND | 2010-01-20 | — | — | CN | claimed |
| CN-103923438-A | Resin Composition For Laminating And Use Thereof | NIPPON CATALYTIC CHEM IND | 2014-07-16 | — | — | CN | disclosed |
| CN-103666108-A | Inkjet ink composition and method for producing the same, inkjet recording method, pigment dispersion for inkjet ink and method for producing the same | FUJIFILM CORP | 2014-03-26 | — | — | CN | disclosed |
| CN-102272227-B | Radiation curable resin composition and rapid three-dimensional imaging method using the same | DSM IP ASSETS BV | 2014-03-12 | — | — | CN | disclosed |
| CN-103415540-A | Photosensitive composition, cured article, and method for producing actinically cured article | SANYO CHEMICAL IND LTD | 2013-11-27 | — | — | CN | disclosed |
| CN-103189413-A | Cation-curable resin composition | NIPPON CATALYTIC CHEM IND | 2013-07-03 | — | — | CN | disclosed |
| CN-101842409-B | Salt compound, cationic polymerization initiator and cationically polymerizable composition | ADEKA CORP | 2013-05-01 | — | — | CN | disclosed |
| CN-102971382-A | Curable composition | HUNTSMAN ADV MAT SWITZERLAND | 2013-03-13 | — | — | CN | disclosed |
| CN-101631817-B | Curable composition | HUNTSMAN ADV MAT SWITZERLAND | 2012-11-14 | — | — | CN | disclosed |
| CN-102666612-A | transparent fluoropolymer | UNIV IBARAKI | 2012-09-12 | — | — | CN | disclosed |
| CN-101631832-A | Photocurable compositions for preparing ABS-like articles | HUNTSMAN ADV MAT SWITZERLAND | 2010-01-20 | — | — | CN | disclosed |
| CN-101591417-A | Curable compositions and its quick molding method of use | DSM IP ASSETS BV (NL) | 2009-12-02 | — | — | CN | disclosed |
| CN-100523030-C | Curable composition and rapid prototyping process using same | DSM IP ASSETS BV (NL) | 2009-08-05 | — | — | CN | disclosed |
| CN-101205082-A | Process for producing titanium-containing metal oxide, hologram recording material, process for producing the same, and hologram recording medium | TDK CORP (JP) | 2008-06-25 | — | — | CN | disclosed |
| CN-101191027-A | Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these | SEIKO EPSON CORP (JP) | 2008-06-04 | — | — | CN | disclosed |
| CN-101173127-A | Ink set | SEIKO EPSON CORP (JP) | 2008-05-07 | — | — | CN | disclosed |
| CN-1989145-A | Novel fluorinated alkyl fluorophosphoric acid onium salts and transition metal complex salts | SAN APRO LTD (JP) | 2007-06-27 | — | — | CN | disclosed |
| CN-1705691-A | Curable composition and rapid prototyping process using same | DSM IP ASSETS BV (NL) | 2005-12-07 | — | — | CN | disclosed |
| CN-1397588-A | Photocationic solidified resin compsn. and its application | MITSUI CHEMICALS INC (JP) | 2003-02-19 | — | — | CN | disclosed |
| CN-1354763-A | Resin composition for photofabrication of three dimensional objects | DSM NV (NL) | 2002-06-19 | — | — | CN | disclosed |