SCHEMBL27562020

SCHEMBL27562020

c1ccc(Sc2ccc(-c3ccccc3)c(-c3ccccc3)c2)cc1

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAOA P21397 5/20 0.56
MAOB P27338 5/20 0.56
BCL2 P10415 3/20 0.53
MCL1 Q07820 3/20 0.53
HTR2C P28335 2/20 0.40
HTR6 P50406 1/20 0.40
ALDH1A1 P00352 2/20 0.39
HPGD P15428 1/20 0.39
BACE1 P56817 1/20 0.39
ALOX5 P09917 1/20 0.39
CYP1A2 P05177 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
SLC6A4 P31645 1/20 0.36
PLA2G1B P04054 1/20 0.36
ATG4B Q9Y4P1 1/20 0.36
ESR2 Q92731 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL27782734 0.98 MAOA (0.55) MAOAMAOBBCL2MCL1HTR2C
SCHEMBL11763851 0.84 MAOA (0.46) MAOAMAOBBCL2MCL1ALDH1A1
SCHEMBL21603042 0.82 BCL2 (0.46) MAOAMAOBBCL2MCL1ALDH1A1
Hydrogen Sulfide SCHEMBL27721391 0.82 MAOA (0.45) MAOAMAOBBCL2MCL1ALDH1A1
SCHEMBL3790361 0.82 ALDH1A1 (0.48) MAOAMAOBBCL2MCL1HTR2C
SCHEMBL28494037 0.82 MAOA (0.47) MAOAMAOBBCL2MCL1HTR2C
SCHEMBL19086319 0.82 ESR2 (0.53) MAOAMAOBBCL2MCL1HTR2C
SCHEMBL3790322 0.82 ALDH1A1 (0.48) MAOAMAOBBCL2MCL1HTR2C
SCHEMBL11767098 0.81 PTGS2 (0.45) MAOAMAOBALDH1A1HPGDBACE1
Hydrogen Sulfide SCHEMBL27982026 0.81 BCL2 (0.45) MAOAMAOBBCL2MCL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101827880-B Precursor for heat-resistant resin and photosensitive resin composition containing the same ASAHI KASEI E MATERIALS CORP 2013-08-21 CN disclosed
CN-101328298-B Copolymer, resin composition, overcoating film and process for forming the same JSR CORP 2012-03-07 CN disclosed
CN-101827880-A Precursor for heat-resistant resin and photosensitive resin composition containing the same ASAHI KASEI E MATERIALS CORP 2010-09-08 CN disclosed
CN-100506863-C Copolymer, resin composition, protective film, and method for forming protective film JSR CORP (JP) 2009-07-01 CN disclosed
CN-101328298-A Copolymer, resin composition, overcoating film and process for forming the same JSR CORP (JP) 2008-12-24 CN disclosed
CN-1311037-C Resin composition and protective film JSR CORP (JP) 2007-04-18 CN disclosed
CN-1817966-A Composition for forming protection film and protection film JSR CORP (JP) 2006-08-16 CN disclosed
CN-1789296-A Copolymer, resin composition, protective film, and method for forming protective film JSR CORP (JP) 2006-06-21 CN disclosed
CN-1246402-C Resin composition and protective film JSR CORP (JP) 2006-03-22 CN disclosed
CN-1683461-A Resin composition and protective film JSR CORP (JP) 2005-10-19 CN disclosed
CN-1458209-A Resin composition and protective film JSR CORP (JP) 2003-11-26 CN disclosed