Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSPA5 | P11021 | 1/20 | 0.50 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.39 |
| ▸ | PTPN5 | P54829 | 3/20 | 0.39 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.39 |
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.37 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.37 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.36 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29493115 | 1.00 | HSPA5 (0.50) | HSPA5PTGDR2PTPN5PTPN2NAAA | |
| SCHEMBL4058553 | 0.92 | PTGDR2 (0.41) | HSPA5PTGDR2PTPN5PTPN2NAAA | |
| SCHEMBL11598412 | 0.90 | PTPN5 (0.39) | HSPA5PTGDR2PTPN5PTPN2NAAA | |
| SCHEMBL23174787 | 0.86 | NUDT1 (0.39) | PTGDR2PTPN5PTPN2NAAANUDT1 | |
| SCHEMBL9638052 | 0.84 | HSPA5 (0.46) | HSPA5PTGDR2NAAAKEAP1MEN1 | |
| SCHEMBL27221198 | 0.83 | AMY1A (0.51) | PTGDR2PTPN5PTPN2NAAAKMT2A | |
| SCHEMBL23174721 | 0.80 | NUDT1 (0.38) | PTGDR2PTPN5PTPN2NAAAHDAC4 | |
| SCHEMBL27728789 | 0.80 | PTGDR2 (0.40) | PTGDR2PTPN5PTPN2NAAAMEN1 | |
| SCHEMBL27584478 | 0.80 | KEAP1 (0.45) | PTPN5PTPN2NAAAKEAP1NUDT1 | |
| SCHEMBL1053897 | 0.79 | HDAC4 (0.46) | PTGDR2PTPN5PTPN2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107848926-A | Novolac type phenolic hydroxyl group-containing resin and resist film | DIC株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-105392765-B | Compound, photosensitive composite, resist composition, resist film, solidification compound, resist composition for underlayer film and the resist lower membrane of phenolic hydroxy group | DIC株式会社 | 2018-03-02 | — | — | CN | disclosed |
| CN-107531858-A | Phenolic varnish type resin containing phenolic hydroxyl group and etchant resist | DIC株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-107108418-A | Phenolic hydroxyl group-containing compound, composition containing same, and cured film thereof | DIC株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-107111229-A | Permanent film solidification compound against corrosion and permanent film against corrosion | DIC株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-107001550-A | Novolak phenolics, its manufacture method, photosensitive composite, erosion resistant and film | DIC株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-107003612-A | Resist lower membrane formation photosensitive composite and resist lower membrane | DIC株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-106795258-A | Phenolic hydroxy group resin, preparation method, photonasty or solidification compound, erosion resistant, film, solidfied material and resist lower membrane | DIC株式会社 | 2017-05-31 | — | — | CN | disclosed |
| CN-106795077-A | Naphthol type calixarene compound and its manufacture method, photosensitive composite, erosion resistant and film | DIC株式会社 | 2017-05-31 | — | — | CN | disclosed |
| CN-106462063-A | Photosensitive composition for permanent film, resist material and coating film | DIC株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-103384850-A | Positive photoresist composition, coating film thereof, and novolac phenol resin | DAINIPPON INK & CHEMICALS | 2013-11-06 | — | — | CN | disclosed |
| CN-103309152-A | Resist pattern formation method, pattern formation method, solar cell and positive resist composition | TOKYO OHKA KOGYO CO LTD | 2013-09-18 | — | — | CN | disclosed |
| CN-103270451-A | Positive-type photoresist composition | DAINIPPON INK & CHEMICALS | 2013-08-28 | — | — | CN | disclosed |
| CN-103210349-A | Positive-type photoresist composition | DAINIPPON INK & CHEMICALS | 2013-07-17 | — | — | CN | disclosed |
| CN-103069339-A | Resin composition for photoresist | SUMITOMO BAKELITE CO | 2013-04-24 | — | — | CN | disclosed |
| CN-102520580-A | Method for forming photoresist pattern | HITACHI CHEMICAL CO LTD | 2012-06-27 | — | — | CN | disclosed |
| CN-100472330-C | Bilayer laminate and patterning method using the same | JSR CORP (JP) | 2009-03-25 | — | — | CN | disclosed |
| CN-101253449-A | Photosensitive resin composition and photosensitive element | HITACHI CHEMICAL CO LTD (JP) | 2008-08-27 | — | — | CN | disclosed |
| CN-101231465-A | Two-layer film and method of forming pattern by using the same | JSR CORP (JP) | 2008-07-30 | — | — | CN | disclosed |
| CN-1503930-A | Bilayer laminate and patterning method using the same | ������ʱ����ʽ���� | 2004-06-09 | — | — | CN | disclosed |