SCHEMBL27614540

SCHEMBL27614540

CC1CC(C)(C)CC(C)(NN)C1

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7062454 0.79 ESR1 (0.36) ESR1ESR2
SCHEMBL4413629 0.74 ESR1 (0.45) ESR1ESR2ALDH1A1
SCHEMBL27872000 0.74 ALDH1A1 (0.34) ESR1ESR2ALDH1A1
SCHEMBL25795874 0.69 ALDH1A1 (0.34) ESR1ESR2ALDH1A1
SCHEMBL540773 0.69 ESR1 (0.38) ESR1ESR2
SCHEMBL635664 0.69 ESR1 (0.38) ESR1ESR2
SCHEMBL4096134 0.69 ESR1 (0.38) ESR1ESR2
SCHEMBL658128 0.69 ESR1 (0.38) ESR1ESR2
SCHEMBL910279 0.68
Ammonia Solution, Strong SCHEMBL8948373 0.67 ESR1 (0.37) ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107428911-A Amine for fast-curing epoxy resin composition SIKA技术股份公司 2017-12-01 CN claimed
CN-110494421-A Photosensitiser composition containing rylene -1- ketone, rylene -1- ketone compound and application thereof TRIOPTOTEC GMBH 2019-11-22 CN disclosed
CN-110382587-A The method for being used to prepare the curing agent of low emission composition epoxy resin SIKA技术股份公司 2019-10-25 CN disclosed
CN-110114413-A POLYAMIDE RESIN COMPOSITION AND MOLDED ARTICLE PRODUCED THEREFROM 乐天尖端材料株式会社 2019-08-09 CN disclosed
CN-105144422-B Battery use packing material 大日本印刷株式会社 2019-05-10 CN disclosed
CN-109415562-A Polyphenyl thioether resin composition and the hollow molded article for having used the polyphenyl thioether resin composition 东丽株式会社 2019-03-01 CN disclosed
CN-107207650-A Conversion method between incompatible catalyst SABIC环球技术有限责任公司 2017-09-26 CN disclosed
CN-107207649-A Conversion method between incompatible catalyst SABIC环球技术有限责任公司 2017-09-26 CN disclosed
CN-107108839-A Novel polyurethane dispersions based on renewable raw materials 巴斯夫欧洲公司 2017-08-29 CN disclosed
CN-105637034-B Amilan polyamide resin composition, manufacture method, products formed 东丽株式会社 2017-06-30 CN disclosed
CN-101084251-A Radiation-hardenable compounds BASF AG (DE) 2007-12-05 CN disclosed
CN-101080447-A Antistatic finished polymer compositions, their preparation and use BAERLOCHER GMBH (DE) 2007-11-28 CN disclosed
CN-101056701-A Low-viscosity microcapsule dispersions BASF AG (DE) 2007-10-17 CN disclosed
CN-1969001-A Stabilizer composition for colored halogen-containing thermoplastic resin compositions BAERLOCHER GMBH (DE) 2007-05-23 CN disclosed
CN-1946799-A Stabilizer composition for halogen-containing thermoplastic resin compositions having an improved shelf life BAERLOCHER GMBH (DE) 2007-04-11 CN disclosed
CN-1942455-A Radiation curable 1,3, 5-triazine carbamates and 1,3, 5-triazine ureas containing vinyl, methacryloyl, or acryloyl groups BASF AG (DE) 2007-04-04 CN disclosed
CN-1894332-A Stabilizer composition for halogenated polymers BAERLOCHER GMBH (DE) 2007-01-10 CN disclosed
CN-1878807-A Polyurethane dispersion comprising siloxane groups BASF AG (DE) 2006-12-13 CN disclosed
CN-1717442-A Stabilisation composition for halogen-containing polymers BAERLOCHER GMBH (DE) 2006-01-04 CN disclosed
CN-1675251-A Aid and method for processing thermoplastic polymer compositions BAERLOCHER GMBH (DE) 2005-09-28 CN disclosed