SCHEMBL2761592

SCHEMBL2761592

[CH2]C(OCCCCCC)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
LTA4H P09960 1/20 0.43
LMNA P02545 2/20 0.42
HTR2A P28223 1/20 0.41
TSHR P16473 2/20 0.41
ALDH1A1 P00352 1/20 0.41
KCNH2 Q12809 1/20 0.40
TP53 P04637 1/20 0.40
NAAA Q02083 2/20 0.40
PLA2G4B P0C869 1/20 0.39
DNM1 Q05193 1/20 0.39
PTPN1 P18031 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2762163 1.00 NPC1 (0.44) NPC1RAB9ASMN1; SMN2LTA4HLMNA
SCHEMBL16056044 1.00 NPC1 (0.44) NPC1RAB9ASMN1; SMN2LTA4HLMNA
SCHEMBL2761483 0.98 LTA4H (0.44) NPC1RAB9ASMN1; SMN2LTA4HLMNA
SCHEMBL8080315 0.93 LTA4H (0.44) NPC1RAB9ASMN1; SMN2LTA4HLMNA
SCHEMBL6239010 0.85 LMNA (0.43) SMN1; SMN2LMNAHTR2ATSHRKCNH2
SCHEMBL27396397 0.82 NPC1 (0.44) NPC1RAB9ASMN1; SMN2LTA4HLMNA
SCHEMBL28676094 0.81 KCNH2 (0.55) NPC1RAB9ASMN1; SMN2LMNAHTR2A
SCHEMBL9155398 0.81 NPC1 (0.47) NPC1RAB9ASMN1; SMN2LTA4HLMNA
SCHEMBL27951679 0.81 KCNH2 (0.55) NPC1RAB9ASMN1; SMN2LMNAHTR2A
SCHEMBL11057451 0.81 NPC1 (0.47) NPC1RAB9ASMN1; SMN2LTA4HLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108473784-B Polyfunctional polymerizable compound and coloring composition 富士胶片和光纯药株式会社 2021-01-12 CN disclosed
EP-2399168-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM Corporation (JP) 2011-12-28 EP disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed