1,4-Diethoxybenzene

1,4-Diethoxybenzene

SCHEMBL27616183

C=C.CCOc1ccc(OCC)cc1

nearest known ligand 0.88

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO1 P15559 1/20 0.88
TSHR P16473 1/20 0.67
TDP1 Q9NUW8 1/20 0.67
LTA4H P09960 2/20 0.61
KDM4E B2RXH2 2/20 0.54
ALDH1A1 P00352 2/20 0.54
PARP10 Q53GL7 1/20 0.54
RELA Q04206 1/20 0.54
CA12 O43570 1/20 0.54
CA1 P00915 1/20 0.54
CA2 P00918 1/20 0.54
CA7 P43166 1/20 0.54
CA9 Q16790 1/20 0.54
PRSS1 P07477 1/20 0.54
PRSS2 P07478 1/20 0.54
PRSS3 P35030 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
ADRA2A P08913 2/20 0.52
MAPT P10636 1/20 0.52
NPC1 O15118 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,4-Diethoxybenzene SCHEMBL124015 0.94 NQO1 (1.00) NQO1TSHRTDP1LTA4HKDM4E
1,4-Diethoxybenzene SCHEMBL28186701 0.94 NQO1 (1.00) NQO1TSHRTDP1LTA4HKDM4E
1,4-Diethoxybenzene SCHEMBL11794798 0.90 NQO1 (0.93) NQO1TSHRTDP1LTA4HKDM4E
1-Butyloxy-4-Ethoxybenzene SCHEMBL27940791 0.87 NQO1 (0.67) NQO1TSHRTDP1LTA4HKDM4E
Phenetole SCHEMBL27256769 0.86 LTA4H (0.74) NQO1TSHRTDP1LTA4HKDM4E
SCHEMBL9664138 0.86 NQO1 (0.74) NQO1TSHRTDP1LTA4HKDM4E
SCHEMBL128504 0.86 NQO1 (0.74) NQO1TSHRTDP1LTA4HKDM4E
SCHEMBL9619483 0.86 NQO1 (0.74) NQO1TSHRTDP1LTA4HKDM4E
SCHEMBL12476726 0.85 NQO1 (0.82) NQO1TSHRTDP1LTA4HKDM4E
1,4-Diethoxybenzene SCHEMBL10704631 0.85 NQO1 (0.82) NQO1TSHRTDP1LTA4HKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102759859-A Method for making resin composition, hardening composition, and resin pattern, hardening composition, and optical component FUJIFILM CORP 2012-10-31 CN disclosed
CN-1704845-A Photosensitive polymer and chemically amplified photoresist composition containing the same DONGJIN SEMICHEM CO LTD (KR) 2005-12-07 CN disclosed