SCHEMBL27616243

SCHEMBL27616243

CCC(=O)CC.CCc1ccccc1CC

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.53
GABRA1 P14867 2/20 0.50
GABRB2 P47870 2/20 0.50
IAPP P10997 1/20 0.47
HSD11B1 P28845 1/20 0.47
CES2 O00748 1/20 0.43
CES1 P23141 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.40
NPC1 O15118 1/20 0.40
ALDH1A1 P00352 1/20 0.40
RAB9A P51151 1/20 0.40
CLCN2 P51788 1/20 0.40
MGLL Q99685 1/20 0.40
MAPT P10636 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
AKR1B1 P15121 1/20 0.39
GRIN2D O15399 1/20 0.39
GRIN3B O60391 1/20 0.39
GRIN1 Q05586 1/20 0.39
GRIN2A Q12879 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29210932 0.88 GABRA1 (0.44) TDP1GABRA1GABRB2IAPPHSD11B1
SCHEMBL27564988 0.86 IAPP (0.55) TDP1GABRA1GABRB2IAPPAKR1B1
SCHEMBL27670501 0.84 RIPK1 (0.47) TDP1GABRA1GABRB2IAPPHSD11B1
Bicarbonate SCHEMBL14635340 0.83 GABRA1 (0.55) GABRA1GABRB2CES2CES1SMN1; SMN2
Bicarbonate SCHEMBL29051241 0.83 GABRA1 (0.55) GABRA1GABRB2CES2CES1SMN1; SMN2
Hydrogen Peroxide SCHEMBL11205186 0.83 GABRA1 (0.60) GABRA1GABRB2CES2CES1ALDH1A1
Hydrogen Peroxide SCHEMBL10890655 0.83 GABRA1 (0.60) GABRA1GABRB2CES2CES1ALDH1A1
SCHEMBL25425763 0.83 GABRA1 (0.58) GABRA1GABRB2ALDH1A1MGLLMAPT
SCHEMBL29390847 0.83 GABRA1 (0.58) GABRA1GABRB2ALDH1A1MGLLMAPT
SCHEMBL36294 0.83 GABRA1 (0.58) GABRA1GABRB2ALDH1A1MGLLMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109563250-A Polymer, composition, formed body, hardening thing and laminated body JSR株式会社 2019-04-02 CN disclosed
CN-105899616-B Curable organopolysiloxane composition and release film for use with dielectric ceramic layer-forming material using the same 道康宁东丽株式会社 2019-02-22 CN disclosed
CN-109071804-A Polymer, composition, molded body, cured product, and laminate JSR株式会社 2018-12-21 CN disclosed
CN-107429088-A Hardcoats and related compositions, methods, and articles 美国道康宁公司 2017-12-01 CN disclosed
CN-104704071-B Releasing laminate and production method thereof 道康宁东丽株式会社 2017-05-17 CN disclosed
CN-105899616-A Curable organopolysiloxane composition and release film for use with dielectric ceramic layer-forming material using the same 道康宁东丽株式会社 2016-08-24 CN disclosed
CN-103298885-B Highly transparent, thermally conductive silicone composition and cured material SHINETSU CHEMICAL CO 2015-06-24 CN disclosed
CN-104704071-A Releasing laminate and production method thereof DOW CORNING TORAY CO LTD 2015-06-10 CN disclosed
CN-104685013-A Curable organopolysiloxane composition, sheet-like article having cured layer formed from the composition, and laminate DOW CORNING TORAY CO LTD 2015-06-03 CN disclosed
CN-104684730-A Curable organopolysiloxane composition, sheet-like article having cured layer formed from the composition, and laminate DOW CORNING TORAY CO LTD 2015-06-03 CN disclosed
CN-102165031-A Organic-inorganic complexes containing luminescent rare earth nanoclusters and antenna ligands, luminescent articles, and methods of making luminescent compositions BATTELLE MEMORIAL INSTITUTE 2011-08-24 CN disclosed
CN-1678252-B Apparatus for transmitting heat energy, device for providing light in predetermined direction and light emitting device DAHM JONATHAN S 2011-06-29 CN disclosed
CN-101848972-A Solvent-based release coating-forming organopolysiloxane composition and release film or sheet DOW CORNING TORAY CO LTD 2010-09-29 CN disclosed
CN-100513485-C Silicone rubber composition for electrode circuit protection, electrode circuit protection material, and electrical and electronic component SHINETSU CHEMICAL CO (JP) 2009-07-15 CN disclosed
CN-100466079-C Hologram recording medium TOSHIBA KK (JP) 2009-03-04 CN disclosed
CN-101037538-A Ultraviolet-curable organopolysiloxane gel composition for optical pickup SHINETSU CHEMICAL CO (JP) 2007-09-19 CN disclosed
CN-1815590-A Hologram recording medium TOKYO SHIBAURA ELECTRIC CO (JP) 2006-08-09 CN disclosed
CN-1705684-A Fast moisture curing and UV-moisture dual curing compositions HENKEL LOCTITE CORP (US) 2005-12-07 CN disclosed
CN-1678252-A Method and apparatus for curing using light emitting diodes DAHM JONATHAN S (US) 2005-10-05 CN disclosed
CN-1621448-A Silicone rubber composition for electrode circuit protection, electrode circuit protection material, and electrical and electronic component SHINETSU CHEMICAL CO (JP) 2005-06-01 CN disclosed