⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23064427 | 0.85 | ALDH1A1 (0.30) | — | |
| SCHEMBL27548196 | 0.79 | — | — | |
| SCHEMBL23064398 | 0.69 | THRB (0.33) | — | |
| SCHEMBL23064411 | 0.68 | LMNA (0.33) | — | |
| SCHEMBL784026 | 0.68 | MEN1 (0.38) | — | |
| SCHEMBL2692362 | 0.67 | — | — | |
| SCHEMBL23064431 | 0.66 | ALDH1A1 (0.35) | — | |
| SCHEMBL4601055 | 0.66 | ALDH1A1 (0.52) | — | |
| SCHEMBL20599848 | 0.65 | — | — | |
| SCHEMBL28213784 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100590529-C | Silicon containing 193nm negative photo resist and membrane forming resin | KUNSHAN XIDI PHOTOELECTRIC MATERIAL CO LTD | 2010-02-17 | — | — | CN | disclosed |
| CN-1834785-A | Silicon contg. 193nm negative photo resist and membrane forming resin | HUAFEI MICROELECTRONIC MATERIA (CN) | 2006-09-20 | — | — | CN | disclosed |
| CN-1828418-A | 193nm photoresist containing silicon coupling agent and its filming resin | SUZHOU HUAFEI MICROELECTRONICS (CN) | 2006-09-06 | — | — | CN | disclosed |