Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 3/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.42 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.41 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.41 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.41 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL730686 | 0.83 | ALDH1A1 (0.48) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL416115 | 0.83 | ALDH1A1 (0.48) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL1058732 | 0.82 | MAPK1 (0.55) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL25260949 | 0.81 | ALDH1A1 (0.46) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL13993130 | 0.81 | ALDH1A1 (0.46) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL28174698 | 0.80 | ALDH1A1 (0.50) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL9891044 | 0.78 | ALDH1A1 (0.48) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL4082774 | 0.78 | ALDH1A1 (0.48) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL29199451 | 0.78 | ALDH1A1 (0.48) | ALDH1A1ALOX15ESR1ESR2CYP3A4 | |
| SCHEMBL164244 | 0.77 | ALDH1A1 (0.52) | ALDH1A1ALOX15ESR1ESR2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107924123-A | Photoetching material and its manufacture method, photoetching composition, pattern formation method and, compound, resin and their purification process | 学校法人关西大学 | 2018-04-17 | — | — | CN | disclosed |
| CN-107533290-A | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 三菱瓦斯化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-106957217-A | Polyphenol compound for anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2017-07-18 | — | — | CN | disclosed |
| CN-103102251-B | Radiation-ray sensitive composition | MITSUBISHI GAS CHEMICAL INC. (JP) | 2016-01-20 | — | — | CN | disclosed |
| CN-105264440-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2016-01-20 | — | — | CN | disclosed |
| CN-104737073-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2015-06-24 | — | — | CN | disclosed |
| CN-104281006-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2015-01-14 | — | — | CN | disclosed |
| CN-103733135-A | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | MITSUBISHI GAS CHEMICAL CO | 2014-04-16 | — | — | CN | disclosed |
| CN-101528653-B | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2013-09-11 | — | — | CN | disclosed |
| CN-103102251-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2013-05-15 | — | — | CN | disclosed |
| CN-102753509-A | Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-10-24 | — | — | CN | disclosed |
| CN-102596874-A | Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-07-18 | — | — | CN | disclosed |
| CN-102597034-A | Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-07-18 | — | — | CN | disclosed |
| CN-102498104-A | Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-06-13 | — | — | CN | disclosed |
| CN-1942825-B | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2010-05-12 | — | — | CN | disclosed |
| CN-101528653-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-09 | — | — | CN | disclosed |
| CN-1942825-A | Resist composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-04 | — | — | CN | disclosed |