Fluoride

Fluoride

SCHEMBL27660693

CCC[SiH](CCC)CCC.F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL126009 0.95 LMNA (0.31)
SCHEMBL28759835 0.91
SCHEMBL704572 0.91
Hydrochloric Acid SCHEMBL3749298 0.91
Ethylene SCHEMBL26666820 0.87
Tetramethylammonium Ion SCHEMBL27799040 0.84 CHRNB2 (0.31)
SCHEMBL708607 0.84 TSHR (0.33)
SCHEMBL707919 0.84 TSHR (0.33)
Boric Acid SCHEMBL28458203 0.81 ANPEP (0.33)
SCHEMBL10415307 0.81 TSHR (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110383565-A Addition agent of non-aqueous electrolyte, nonaqueous electrolytic solution and electrical storage device 住友精化株式会社 2019-10-25 CN disclosed
CN-110061283-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2019-07-26 CN disclosed
CN-110010850-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2019-07-12 CN disclosed
CN-109913220-A Etching composition 秀博瑞殷株式公社 2019-06-21 CN disclosed
CN-105273718-B Etching composition 秀博瑞殷株式公社 2019-05-03 CN disclosed
CN-109689838-A Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2019-04-26 CN disclosed
CN-104659414-B Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2019-04-12 CN disclosed
CN-105829485-B Photocurable composition with adhesiveness 思美定株式会社 2018-10-12 CN disclosed
CN-108291132-A Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2018-07-17 CN disclosed
CN-104752642-B Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2018-04-20 CN disclosed
CN-104144969-A POLYTHIOETHERS, MOISTURE CURABLE COMPOSITIONS AND METHODS FOR THEIR MANUFACTURE AND USE PRC DESOTO INT INC 2014-11-12 CN disclosed
CN-102931434-A Lithium secondary battery and nonaqueous electrolyte used therein MITSUBISHI CHEM CORP 2013-02-13 CN disclosed
CN-101426859-B Curable composition KANEGAFUCHI CHEMICAL IND 2012-03-21 CN disclosed
CN-102324567-A Lithium secondary battery and nonaqueous electrolyte used therein MITSUBISHI CHEMICAL KK 2012-01-18 CN disclosed
CN-101894974-A Lithium secondary battery and nonaqueous electrolyte used therein MITSUBISHI CHEM CORP 2010-11-24 CN disclosed
CN-101292389-B Lithium secondary battery and nonaqueous electrolyte used therein MITSUBISHI CHEM CORP 2010-09-22 CN disclosed
CN-100535054-C Silica film forming material, silica film and preparation method thereof FUJITSU LTD (JP) 2009-09-02 CN disclosed
CN-101426859-A Curable composition KANEGAFUCHI CHEMICAL IND (JP) 2009-05-06 CN disclosed
CN-101292389-A Lithium secondary battery and nonaqueous electrolyte used therein MITSUBISHI CHEM CORP (JP) 2008-10-22 CN disclosed
CN-1891757-A Silica film forming material, silica film and method of manufacturing the same FUJITSU LTD (JP) 2007-01-10 CN disclosed