SCHEMBL27669481

SCHEMBL27669481

CC(C)(C)c1ccccc1S.FC(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
TDP1 Q9NUW8 3/20 0.44
TSHR P16473 1/20 0.44
CA2 P00918 1/20 0.41
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
KIF11 P52732 1/20 0.34
HSD11B1 P28845 2/20 0.31
NPSR1 Q6W5P4 1/20 0.31
NFKB1 P19838 1/20 0.31
POLB P06746 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
NISCH Q9Y2I1 1/20 0.30
MAPT P10636 1/20 0.30
GRIN2D O15399 1/20 0.30
GRIN3B O60391 1/20 0.30
GRIN1 Q05586 1/20 0.30
GRIN2A Q12879 1/20 0.30
GRIN2B Q13224 1/20 0.30
GRIN2C Q14957 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30772132 0.93 ALDH1A1 (0.50) ALDH1A1TDP1TSHRCA2GABRA1
SCHEMBL732202 0.93 ALDH1A1 (0.50) ALDH1A1TDP1TSHRCA2GABRA1
SCHEMBL6256646 0.90 ALDH1A1 (0.48) ALDH1A1TDP1TSHRCA2GABRA1
SCHEMBL22367879 0.90 ALDH1A1 (0.48) ALDH1A1TDP1TSHRCA2GABRA1
Water SCHEMBL9956053 0.90 ALDH1A1 (0.48) ALDH1A1TDP1TSHRCA2GABRA1
Trifluoromethanesulfonic Acid SCHEMBL4225729 0.78 TSHR (0.44) ALDH1A1TDP1TSHRCA2HSD11B1
SCHEMBL9396200 0.77 ALDH1A1 (0.39) ALDH1A1TDP1TSHRCA2GABRA1
Tromethamine SCHEMBL6864022 0.76 ALDH1A1 (0.41) ALDH1A1TDP1TSHRCA2GABRA1
SCHEMBL27672332 0.74 ALDH1A1 (0.43) ALDH1A1TDP1TSHRCA2GABRA1
SCHEMBL28696471 0.74 ALDH1A1 (0.43) ALDH1A1TDP1TSHRCA2GABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106687863-A Passivation layer comprising a photocrosslinked fluoropolymer 科慕埃弗西有限公司 2017-05-17 CN claimed
CN-101044185-B Photosensitive compositions based on polycyclic polymers PROMERUS LLC 2012-07-04 CN claimed
CN-106687863-A Passivation layer comprising a photocrosslinked fluoropolymer 科慕埃弗西有限公司 2017-05-17 CN disclosed
CN-101432867-B Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC 2013-10-23 CN disclosed
CN-103311208-A Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC 2013-09-18 CN disclosed
CN-101044185-B Photosensitive compositions based on polycyclic polymers PROMERUS LLC 2012-07-04 CN disclosed
CN-1976962-B Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon MITSUBISHI RAYON CO 2010-06-23 CN disclosed
CN-101679721-A Resin composition, filling material, insulating layer and semiconductor device SUMITOMO BAKELITE CO 2010-03-24 CN disclosed
CN-101432867-A Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC (US) 2009-05-13 CN disclosed
CN-101088047-A Material for forming resist protection films and method for resist pattern formation with the same TOKYO OHKA KOGYO CO LTD (JP) 2007-12-12 CN disclosed
CN-1976962-A Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon MITSUBISHI RAYON CO (JP) 2007-06-06 CN disclosed