⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14455599 | 0.80 | — | — | |
| SCHEMBL728663 | 0.77 | — | — | |
| SCHEMBL730694 | 0.76 | ALDH1A1 (0.40) | — | |
| SCHEMBL124698 | 0.75 | — | — | |
| SCHEMBL35695 | 0.75 | — | — | |
| SCHEMBL1138470 | 0.72 | — | — | |
| SCHEMBL3912026 | 0.72 | — | — | |
| SCHEMBL29824871 | 0.72 | — | — | |
| SCHEMBL11759549 | 0.72 | — | — | |
| SCHEMBL11407685 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8759563-B2 | Low-impurity organosilicon product as precursor for CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-06-24 | — | — | US | disclosed |
| US-20130060061-A1 | Low-Impurity Organosilicon Product as Precursor for CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-03-07 | — | — | US | disclosed |
| US-8329933-B2 | Low-impurity organosilicon product as precursor for CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-12-11 | — | — | US | disclosed |
| US-20110295033-A1 | LOW-IMPURITY ORGANOSILICON PRODUCT AS PRECURSOR FOR CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-12-01 | — | — | US | disclosed |
| CN-101092689-B | Low-impurity organosilicon product as precursor for cvd | AIR PROD & CHEM | 2011-03-30 | — | — | CN | disclosed |
| EP-1867653-B1 | Low-impurity organosilicon product as precursor for CVD | AIR PROD & CHEM (US) | 2010-04-14 | — | — | EP | disclosed |
| EP-1953168-B1 | Method of purifying organosilicon compositions used as precursors in chemical vapor deposition | AIR PROD & CHEM (US) | 2009-07-01 | — | — | EP | disclosed |
| US-20080188679-A1 | Method Of Purifying Organosilicon Compositions Used As Precursors In Chemical Vapor Desposition | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-07 | — | — | US | disclosed |
| EP-1953168-A1 | Method of purifying organosilicon compositions used as precursors in chemical vapor deposition | Air Products and Chemicals, Inc. (US) | 2008-08-06 | — | — | EP | disclosed |
| CN-101092689-A | Low-impurity organosilicon product as precursor for cvd | AIR PROD & CHEM (US) | 2007-12-26 | — | — | CN | disclosed |
| EP-1867653-A1 | Low-impurity organosilicon product as precursor for CVD | Air Products and Chemicals, Inc. (US) | 2007-12-19 | — | — | EP | disclosed |
| US-20070287849-A1 | Low-Impurity Organosilicon Product As Precursor For CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-12-13 | — | — | US | disclosed |