Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2767718 | 0.82 | ALDH1A1 (0.41) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL7054491 | 0.78 | — | — | |
| SCHEMBL730609 | 0.77 | ALDH1A1 (0.37) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL2767045 | 0.76 | — | — | |
| SCHEMBL28195911 | 0.75 | ALDH1A1 (0.43) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL2357366 | 0.75 | ALDH1A1 (0.43) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL2948698 | 0.75 | ALDH1A1 (0.43) | ALDH1A1LMNAHSD17B10TSHR | |
| Methane SCHEMBL29183964 | 0.73 | ALDH1A1 (0.42) | ALDH1A1LMNAHSD17B10TSHR | |
| Ethylene SCHEMBL27137436 | 0.71 | ALDH1A1 (0.40) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL7059089 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-10985013-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2021-04-20 | — | — | US | claimed |
| CN-105845549-B | Method and precursor for manufacturing 3D devices | 弗萨姆材料美国有限责任公司 | 2020-03-03 | — | — | CN | claimed |
| US-20190304775-A1 | Method and Precursors for Manufacturing 3D Devices | VERSUM MATERIALS US, LLC (US) | 2019-10-03 | — | — | US | claimed |
| US-10354860-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2019-07-16 | — | — | US | claimed |
| US-20180047898-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. | 2018-02-15 | — | — | US | claimed |
| EP-2412011-B1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LTD (JP) | 2017-09-20 | — | — | EP | claimed |
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-04 | — | — | US | claimed |
| EP-3051001-A2 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-03 | — | — | EP | claimed |
| US-9212420-B2 | Chemical vapor deposition method | TOKYO ELECTRON LIMITED (JP) | 2015-12-15 | — | — | US | claimed |
| EP-1482070-B1 | MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS | AIR PROD & CHEM (US) | 2015-11-11 | — | — | EP | claimed |
| US-8137764-B2 | organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-03-20 | — | — | US | claimed |
| US-20100247803-A1 | Chemical vapor deposition method | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | US | claimed |
| US-20090096106-A1 | ANTIREFLECTIVE COATINGS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-04-16 | — | — | US | claimed |
| EP-2048700-A2 | Antireflective coatings | Air Products and Chemicals, Inc. (US) | 2009-04-15 | — | — | EP | claimed |
| US-20040241463-A1 | Mechanical enhancer additives for low dielectric films | VERSUM MATERIALS US, LLC | 2004-12-02 | — | — | US | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | disclosed |
| CN-116411261-A | Boron-containing compounds, compositions, and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2023-07-11 | — | — | CN | disclosed |
| US-20030198742-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-10-23 | — | — | US | disclosed |
| EP-1354980-A1 | Method for forming a porous SiOCH layer. | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-10-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10354860-B2 | Method and precursors for manufacturing 3D devices | MEF2D, HTR3D, NSD3 | ALDH1A1 4640/4885LMNA 3947/4885HSD17B10 3019/4885 |
| US-20190304775-A1 | Method and Precursors for Manufacturing 3D Devices | MEF2D, HTR3D, NSD3 | ALDH1A1 4640/4885LMNA 3947/4885HSD17B10 3019/4885 |
| US-10985013-B2 | Method and precursors for manufacturing 3D devices | MEF2D, HTR3D, NSD3 | ALDH1A1 4640/4885LMNA 3947/4885HSD17B10 3019/4885 |
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | MEF2D, HTR3D, NSD3 | ALDH1A1 4640/4885LMNA 3947/4885HSD17B10 3019/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.