Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 1/20 | 0.45 |
| ▸ | CNR2 | P34972 | 1/20 | 0.45 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.38 |
| ▸ | TRPV1 | Q8NER1 | 4/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | PDPK1 | O15530 | 2/20 | 0.35 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.35 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.34 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.34 |
| ▸ | MET | P08581 | 1/20 | 0.33 |
| ▸ | MAPKAPK2 | P49137 | 1/20 | 0.33 |
| ▸ | EP300 | Q09472 | 1/20 | 0.33 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.33 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Quinoline SCHEMBL28024422 | 0.96 | CNR1 (0.42) | CNR1CNR2ALOX5TRPV1HSD11B1 | |
| Quinoline SCHEMBL27651466 | 0.89 | CNR1 (0.37) | CNR1CNR2TP53MAPTSMN1; SMN2 | |
| Quinoline SCHEMBL28771536 | 0.84 | RAB9A (0.43) | CNR1CNR2MAPTPDE10APDGFRB | |
| Quinoline SCHEMBL27722669 | 0.81 | FABP3 (0.40) | TRPV1MAPTPDPK1PDE10APDGFRB | |
| Quinoline SCHEMBL27702294 | 0.81 | FABP3 (0.40) | ALOX5MAPTSMN1; SMN2PDE10APDGFRB | |
| Quinoline SCHEMBL27722665 | 0.81 | RPA1 (0.47) | SMN1; SMN2TDP1PDE10A | |
| Quinoline SCHEMBL28172017 | 0.81 | CNR1 (0.46) | CNR1CNR2ALOX5TRPV1SMN1; SMN2 | |
| Quinoline SCHEMBL28111528 | 0.79 | RAB9A (0.35) | ALOX5TRPV1MAPTPDE10APDGFRB | |
| Quinoline SCHEMBL27671763 | 0.78 | RAB9A (0.35) | TRPV1MAPTPDE10APDGFRBPDGFRA | |
| Quinoline SCHEMBL27651469 | 0.78 | RAB9A (0.36) | TRPV1MAPTPDE10APDGFRBPDGFRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104111583-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacturing method of printed circuit board | 日立化成株式会社 | 2019-01-01 | — | — | CN | disclosed |
| CN-104133343-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacture method of printed circuit board (PCB) | 日立化成株式会社 | 2016-11-16 | — | — | CN | disclosed |
| CN-102375341-B | The manufacture method of photosensitive polymer combination, element, resist figure and lead frame, printed-wiring board (PWB) and manufacture method thereof | HITACHI CHEMICAL CO., LTD. (JP) | 2016-04-06 | — | — | CN | disclosed |
| CN-105431778-A | Photosensitive resin composition | HITACHI CHEMICAL CO LTD | 2016-03-23 | — | — | CN | disclosed |
| CN-102662306-B | The manufacture method of photosensitive element, corrosion-resisting pattern formation method and printed circuit board (PCB) | HITACHI CHEMICAL CO., LTD. (JP) | 2015-11-25 | — | — | CN | disclosed |
| CN-104808444-A | Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same | HITACHI CHEMICAL CO LTD | 2015-07-29 | — | — | CN | disclosed |
| CN-104133343-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2014-11-05 | — | — | CN | disclosed |
| CN-104133342-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2014-11-05 | — | — | CN | disclosed |
| CN-104111583-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2014-10-22 | — | — | CN | disclosed |
| CN-103543608-A | Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same | HITACHI CHEMICAL CO LTD | 2014-01-29 | — | — | CN | disclosed |
| CN-101421671-B | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | HITACHI CHEMICAL CO LTD | 2012-05-30 | — | — | CN | disclosed |
| CN-102375341-A | Manufacturing Method Of Photosensitive Resin Composite, Element And Slushing Compound Pattern, Manufacturing Method Of Lead Frame And Printed Circuit Board | HITACHI CHEMICAL CO LTD | 2012-03-14 | — | — | CN | disclosed |
| CN-102317864-A | Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2012-01-11 | — | — | CN | disclosed |
| CN-102012634-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2011-04-13 | — | — | CN | disclosed |
| CN-1945429-B | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K | 2010-06-09 | — | — | CN | disclosed |
| CN-101421671-A | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2009-04-29 | — | — | CN | disclosed |
| CN-101228196-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2008-07-23 | — | — | CN | disclosed |
| CN-101180578-A | Photosensitive resin composition, photosensitive element, method for forming photoresist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2008-05-14 | — | — | CN | disclosed |
| CN-1945429-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |
| CN-1945428-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |