Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 4/20 | 0.35 |
| ▸ | NPC1 | O15118 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.34 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.34 |
| ▸ | ABL1 | P00519 | 3/20 | 0.33 |
| ▸ | EPHB4 | P54760 | 1/20 | 0.33 |
| ▸ | AXL | P30530 | 1/20 | 0.33 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CASP3 | P42574 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Quinoline SCHEMBL27722669 | 0.88 | FABP3 (0.40) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL27651469 | 0.86 | RAB9A (0.36) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL28771536 | 0.86 | RAB9A (0.43) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL27722665 | 0.82 | RPA1 (0.47) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL27702294 | 0.82 | FABP3 (0.40) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL28111528 | 0.82 | RAB9A (0.35) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL28024422 | 0.79 | CNR1 (0.42) | RAB9ANPC1KDM4ELMNAPKM | |
| Quinoline SCHEMBL27671669 | 0.78 | CNR1 (0.45) | MAPTPDGFRBPDGFRAPDE10AMET | |
| Quinoline SCHEMBL28119447 | 0.74 | MAPT (0.50) | RAB9ANPC1KDM4EMAPTL3MBTL1 | |
| SCHEMBL3752745 | 0.72 | NPC1 (0.54) | RAB9ANPC1KDM4ELMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104111583-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacturing method of printed circuit board | 日立化成株式会社 | 2019-01-01 | — | — | CN | disclosed |
| CN-104133343-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacture method of printed circuit board (PCB) | 日立化成株式会社 | 2016-11-16 | — | — | CN | disclosed |
| CN-105431778-A | Photosensitive resin composition | HITACHI CHEMICAL CO LTD | 2016-03-23 | — | — | CN | disclosed |
| CN-102662306-B | The manufacture method of photosensitive element, corrosion-resisting pattern formation method and printed circuit board (PCB) | HITACHI CHEMICAL CO., LTD. (JP) | 2015-11-25 | — | — | CN | disclosed |
| CN-104808444-A | Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same | HITACHI CHEMICAL CO LTD | 2015-07-29 | — | — | CN | disclosed |
| CN-104133343-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2014-11-05 | — | — | CN | disclosed |
| CN-104133342-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2014-11-05 | — | — | CN | disclosed |
| CN-104111583-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2014-10-22 | — | — | CN | disclosed |
| CN-103543608-A | Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same | HITACHI CHEMICAL CO LTD | 2014-01-29 | — | — | CN | disclosed |
| CN-102317864-A | Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2012-01-11 | — | — | CN | disclosed |
| CN-1945429-B | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K | 2010-06-09 | — | — | CN | disclosed |
| CN-101421671-A | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2009-04-29 | — | — | CN | disclosed |
| CN-101228196-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2008-07-23 | — | — | CN | disclosed |
| CN-1945429-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |
| CN-1945428-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |