SCHEMBL27674491

SCHEMBL27674491

CC(OC(=O)C12C=CC(CC1)C2)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27654564 0.85
SCHEMBL22712634 0.83
SCHEMBL12506502 0.80
SCHEMBL511963 0.80
SCHEMBL28411218 0.79
SCHEMBL5918196 0.78 ADORA2B (0.31)
SCHEMBL7157180 0.75
SCHEMBL996861 0.75 NPSR1 (0.32)
SCHEMBL31178055 0.75 NPSR1 (0.32)
SCHEMBL29276611 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115210219-A Oxime ester photoinitiators 巴斯夫欧洲公司 2022-10-18 CN disclosed
CN-113316744-A Oxime ester photoinitiators with specific aroyl chromophores 巴斯夫欧洲公司 2021-08-27 CN disclosed
CN-101153121-B Radiation-sensitive resin composition for spacer, spacer and method for forming the same JSR CORP 2012-11-14 CN disclosed
CN-100506877-C Curable resin composition, protective film, and method for forming same JSR CORP (JP) 2009-07-01 CN disclosed
CN-101466756-A Thermosetting resin composition, method for forming antihalation film of solid-state imaging element, and solid-state imaging element JSR CORP (JP) 2009-06-24 CN disclosed
CN-101153121-A Radiation-sensitive resin composition for spacer, spacer and method for forming the same JSR CORP (JP) 2008-04-02 CN disclosed
CN-1898291-A Curable resin composition, overcoats, and process for formation thereof JSR CORP (JP) 2007-01-17 CN disclosed