SCHEMBL27680708

SCHEMBL27680708

CCCOC(=O)C(COC)C(C)C

nearest known ligand 0.35

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.35
HCAR2 Q8TDS4 1/20 0.35
ALDH1A1 P00352 3/20 0.34
LMNA P02545 1/20 0.33
HPGD P15428 1/20 0.33
ESR1 P03372 1/20 0.32
CHRM1 P11229 1/20 0.32
TSHR P16473 1/20 0.32
SLC6A2 P23975 1/20 0.32
KDR P35968 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
MAPT P10636 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.31
GRM1 Q13255 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclopropane SCHEMBL27365075 0.94 HCAR2 (0.32) HSD17B10HCAR2ALDH1A1LMNAHPGD
SCHEMBL817864 0.85 ALDH1A1 (0.39) HSD17B10ALDH1A1LMNAHPGDCHRM1
SCHEMBL819348 0.80 SMN1; SMN2 (0.44) HSD17B10ALDH1A1HPGDTSHRMAPT
SCHEMBL11830551 0.79 HCAR2 (0.35) HSD17B10HCAR2ALDH1A1LMNAHPGD
SCHEMBL10405114 0.78 HSD17B10 (0.38) HSD17B10HCAR2ALDH1A1LMNAHPGD
SCHEMBL18468384 0.78 TSHR (0.32) HSD17B10ALDH1A1HPGDTSHRTDP1
SCHEMBL22810807 0.76 GRM1 (0.35) HCAR2ALDH1A1LMNAESR1CHRM1
SCHEMBL16160142 0.75 TSHR (0.37) ALDH1A1TSHRSMN1; SMN2CA1CA2
SCHEMBL30145015 0.75 HCAR2 (0.41) HCAR2ALDH1A1LMNAESR1CHRM1
SCHEMBL28956455 0.74 HSD17B10 (0.38) HSD17B10HCAR2ALDH1A1LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109390223-A The forming method of impurity diffusion agent composition and impurity diffusion layer 东京应化工业株式会社 2019-02-26 CN disclosed
CN-109087969-A The manufacturing method of silicon substrate for solar cell device 东京应化工业株式会社 2018-12-25 CN disclosed
CN-108148153-A Solid catalyst and prepare the method for acrylic polymers or copolymer using it 韩华道达尔有限公司 2018-06-12 CN disclosed
CN-107540617-A Imidazolium compounds, metal surface treating liquid, the manufacture method of metallic surface processing method and lamilate 东京应化工业株式会社 2018-01-05 CN disclosed
CN-106687447-A Imidazole compound, metal surface treatment liquid, metal surface treatment method, and method for producing laminate 东京应化工业株式会社 2017-05-17 CN disclosed
CN-104517820-A Diffusant composition, method for forming impurity diffusion layer TOKYO OHKA KOGYO CO LTD 2015-04-15 CN disclosed
CN-1912742-B Colorant dispersion liquid and photosensitive composition using the same TOKYO OHKA KOGYO CO LTD 2010-05-12 CN disclosed
CN-1912742-A Colorant dispersion liquid and photosensitive composition using the same TOKYO OKE CHEMICAL CO LTD (JP) 2007-02-14 CN disclosed