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Indene

Indene

SCHEMBL2769732

C1=Cc2ccccc2C1.C=C(C)C(=O)O

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 1/20 0.53
▸ CYP2C19 P33261 1/20 0.53
▸ CA1 P00915 2/20 0.40
▸ CA2 P00918 2/20 0.40
▸ HSD17B3 P37058 1/20 0.35
▸ NOTUM Q6P988 3/20 0.35
▸ ALDH1A1 P00352 3/20 0.35
▸ KDM4E B2RXH2 1/20 0.35
▸ MAOA P21397 1/20 0.33
▸ MAOB P27338 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ ELANE P08246 1/20 0.32
▸ AKR1C3 P42330 1/20 0.32
▸ LMNA P02545 1/20 0.31
▸ PARP1 P09874 1/20 0.31
▸ MTNR1A P48039 1/20 0.31
▸ MTNR1B P49286 1/20 0.31
▸ CES2 O00748 1/20 0.31
▸ CES1 P23141 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Indene SCHEMBL29746662 0.89 CYP2D6 (0.51) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL89373 0.89 CYP2D6 (0.51) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL27887053 0.87 CYP2D6 (0.50) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL28769797 0.87 CYP2D6 (0.50) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL28692932 0.87 CYP2D6 (0.56) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL28869263 0.87 CYP2D6 (0.49) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL28841652 0.87 CYP2D6 (0.56) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL30959780 0.85 CA2 (0.47) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL6700608 0.85 CA2 (0.47) CYP2D6CYP2C19CA1CA2HSD17B3
Indene SCHEMBL1255740 0.84 CYP2D6 (0.46) CYP2D6CYP2C19CA1CA2HSD17B3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109439233-B Environment-friendly acrylate structural adhesive and preparation method thereof 烟台德邦科技有限公司 2020-11-10 — — CN claimed
CN-109439233-A Environment-friendly acrylate structural adhesive and preparation method thereof 烟台德邦科技有限公司 2019-03-08 — — CN claimed
EP-2914424-A1 TWO-PART PRIMER COMPOSITION Ashland Licensing And Intellectual Property, LLC (US) 2015-09-09 — — EP claimed
WO-2014070818-A1 TWO-PART PRIMER COMPOSITION ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) 2014-05-08 — — WO claimed
US-20140127499-A1 Two Part Primer Composition ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) 2014-05-08 — — US claimed
CN-109439233-B Environment-friendly acrylate structural adhesive and preparation method thereof 烟台德邦科技有限公司 2020-11-10 — — CN disclosed
CN-110945074-A Epoxy resin composition 株式会社钟化 2020-03-31 — — CN disclosed
CN-108699321-A Strengthening and Toughening composition epoxy resin 株式会社钟化 2018-10-23 — — CN disclosed
EP-2914424-A1 TWO-PART PRIMER COMPOSITION Ashland Licensing And Intellectual Property, LLC (US) 2015-09-09 — — EP disclosed
WO-2014070818-A1 TWO-PART PRIMER COMPOSITION ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) 2014-05-08 — — WO disclosed
US-20140127499-A1 Two Part Primer Composition ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) 2014-05-08 — — US disclosed
EP-1783551-B1 Resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2010-04-14 — — EP disclosed
US-7618763-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-17 — — US disclosed
US-20070105042-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-10 — — US disclosed
EP-1783551-A2 Resist composition and patterning process Shinetsu Chemical Co., Ltd. (JP) 2007-05-09 — — EP disclosed