SCHEMBL27699600

SCHEMBL27699600

O=C(O)c1c[c]cc(C#CC23CC4CC(CC(C4)C2)C3)c1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
EPHX2 P34913 2/20 0.33
HIF1A Q16665 1/20 0.32
EPAS1 Q99814 1/20 0.32
RARB P10826 4/20 0.32
RARG P13631 4/20 0.32
RARA P10276 3/20 0.32
STS P08842 2/20 0.32
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
ALOX15 P16050 1/20 0.32
ALOX12 P18054 1/20 0.32
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2708596 0.84 MEN1 (0.36) MEN1KMT2AEPHX2HIF1AEPAS1
SCHEMBL2189323 0.83 ALDH1A1 (0.30) ALDH1A1
SCHEMBL2708684 0.82 MEN1 (0.35) MEN1KMT2AEPHX2HIF1AEPAS1
Hydrochloric Acid SCHEMBL2706861 0.82 MEN1 (0.35) MEN1KMT2AEPHX2HIF1AEPAS1
SCHEMBL2706856 0.75 HIF1A (0.37) HIF1AEPAS1MAPTFAAH
SCHEMBL2746657 0.74 MEN1 (0.45) MEN1KMT2AEPHX2RARBRARG
Potassium Ion SCHEMBL2708685 0.72 HIF1A (0.34) HIF1AEPAS1
SCHEMBL2710316 0.71 HNF4A (0.39) EPHX2HIF1AEPAS1KDM4EHSD17B10
SCHEMBL27720313 0.71 HIF1A (0.34) MEN1KMT2AEPHX2HIF1AEPAS1
SCHEMBL2746793 0.71 MMP13 (0.46) MEN1KMT2AEPHX2HIF1AEPAS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101268119-B Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE CO 2011-08-17 CN disclosed
CN-101128514-B Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device SUMITOMO BAKELITE CO 2011-05-25 CN disclosed
CN-101268119-A Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-09-17 CN disclosed
CN-101128514-A Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-02-20 CN disclosed