SCHEMBL27706803

SCHEMBL27706803

C=CC(C)(N=C=O)c1ccccc1C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ GABRA1 P14867 1/20 0.31
▸ GABRB2 P47870 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9167846 0.77 TSHR (0.33) —
SCHEMBL6831708 0.77 GABRA1 (0.35) GABRA1GABRB2
SCHEMBL28613862 0.77 GABRA1 (0.35) GABRA1GABRB2
SCHEMBL6430083 0.74 TSHR (0.36) GABRA1GABRB2
SCHEMBL9555423 0.74 TSHR (0.36) GABRA1GABRB2
SCHEMBL29105562 0.74 GABRA1 (0.33) GABRA1GABRB2
SCHEMBL189760 0.72 GABRA1 (0.32) GABRA1GABRB2
SCHEMBL1831794 0.72 GABRA1 (0.33) GABRA1GABRB2
SCHEMBL7800891 0.71 L3MBTL1 (0.35) GABRA1GABRB2
SCHEMBL10977897 0.70 TSHR (0.39) GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101142525-A Pattern formation material, pattern formation device, and pattern formation method FUJI FILM CORP (JP) 2008-03-12 — — CN disclosed
CN-101124516-A Pattern forming material, pattern forming apparatus, and pattern forming method FUJI FILM CORP (JP) 2008-02-13 — — CN disclosed
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