⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28829233 | 0.83 | — | — | |
| SCHEMBL29171379 | 0.80 | LMNA (0.40) | — | |
| SCHEMBL7745085 | 0.78 | LMNA (0.39) | — | |
| SCHEMBL5406960 | 0.78 | — | — | |
| SCHEMBL9698510 | 0.77 | SLC7A5 (0.30) | — | |
| SCHEMBL27482199 | 0.77 | OPRM1 (0.39) | — | |
| SCHEMBL704740 | 0.76 | — | — | |
| SCHEMBL5416272 | 0.76 | LMNA (0.30) | — | |
| SCHEMBL5421485 | 0.76 | LMNA (0.30) | — | |
| SCHEMBL27321110 | 0.76 | LMNA (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8546597-B2 | Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2013-10-01 | — | — | US | disclosed |
| EP-2194060-B1 | Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films | SHINETSU CHEMICAL CO (JP) | 2013-07-17 | — | — | EP | disclosed |
| EP-2194060-A1 | Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-09 | — | — | EP | disclosed |
| US-20100137626-A1 | ORGANIC SILANE COMPOUND FOR FORMING SI-CONTAINING FILM BY PLASMA CVD AND METHOD FOR FORMING SI-CONTAINING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-03 | — | — | US | disclosed |