⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482279 | 0.97 | — | — | |
| SCHEMBL3482185 | 0.86 | LMNA (0.33) | — | |
| SCHEMBL3481687 | 0.85 | — | — | |
| SCHEMBL17088153 | 0.80 | DNM1 (0.35) | — | |
| SCHEMBL703719 | 0.79 | LMNA (0.35) | — | |
| SCHEMBL11025166 | 0.75 | — | — | |
| SCHEMBL2490702 | 0.73 | — | — | |
| SCHEMBL459258 | 0.71 | — | — | |
| SCHEMBL122896 | 0.71 | — | — | |
| SCHEMBL3481730 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8546597-B2 | Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2013-10-01 | — | — | US | disclosed |
| EP-2194060-B1 | Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films | SHINETSU CHEMICAL CO (JP) | 2013-07-17 | — | — | EP | disclosed |
| EP-2194060-A1 | Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-09 | — | — | EP | disclosed |
| US-20100137626-A1 | ORGANIC SILANE COMPOUND FOR FORMING SI-CONTAINING FILM BY PLASMA CVD AND METHOD FOR FORMING SI-CONTAINING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-03 | — | — | US | disclosed |
| EP-2163664-A1 | Method for depositing si-containing film, insulator film, and semiconductor device | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100061915-A1 | METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |