SCHEMBL3481730

SCHEMBL3481730

CC[Si](C)(CC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3481687 0.81
SCHEMBL27689468 0.81
SCHEMBL3481652 0.76 LMNA (0.33)
SCHEMBL14956851 0.74
SCHEMBL2596931 0.73 DNM1 (0.31)
SCHEMBL8374427 0.73 TSHR (0.33)
SCHEMBL13621368 0.72
SCHEMBL3482279 0.72
SCHEMBL18508437 0.72
SCHEMBL2771399 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220301862-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2022-09-22 US claimed
EP-4018013-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM Versum Materials US, LLC (US) 2022-06-29 EP claimed
CN-114616652-A Monoalkoxysilanes and dense organosilica films prepared therefrom 弗萨姆材料美国有限责任公司 2022-06-10 CN claimed
CN-114106458-A Irradiation modified PP melt-blown material and composite forming process thereof 中核同辐(长春)辐射技术有限公司 2022-03-01 CN claimed
WO-2021050659-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2021-03-18 WO claimed
CN-111138865-A Preparation method of novel liquid foaming silica gel for new energy automobile 佛山职业技术学院 2020-05-12 CN claimed
WO-2010082710-A1 METHOD FOR PREPARING A HIGHLY DURABLE REVERSE OSMOSIS MEMBRANE UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) 2010-07-22 WO claimed
EP-3812428-B1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC IP MAN CO LTD (JP) 2025-12-03 EP disclosed
CN-119998691-A Antireflection film, liquid composition set, and method for producing antireflection film 日本板硝子株式会社 2025-05-13 CN disclosed
WO-2024080149-A1 ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM 日本板硝子株式会社 2024-04-18 WO disclosed
US-20230303840-A1 THIXOTROPIC POLYSILOXANE PASTES FOR ADDITIVE MANUFACTURING HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC 2023-09-28 US disclosed
CN-112424290-B Colloid structure, colloid multiple structure, and method for producing colloid structure 松下知识产权经营株式会社 2023-08-22 CN disclosed
US-11680167-B2 Thixotropic polysiloxane pastes for additive manufacturing HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC (US) 2023-06-20 US disclosed
US-6993231-B2 comprises polyesterurethanes/polyetherurethanes; highly elasticity/flexibility; improved heat stability/transmission KANSAI PAINT CO., LTD. (JP) 2006-01-31 US disclosed
US-20040151457-A1 Covering composition for optical fiber and covered optical fiber KANSAI PAINT CO., LTD. 2004-08-05 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed
CN-1109155-C Treating agent for polyurethane elastic fiber and polyurethane elastic fiber treated with the same TAKEMOTO OIL & FALT CO LTD (JP) 2003-05-21 CN disclosed
CN-1226945-A Treating agent for polyurethane elastic fiber and polyurethane elastic fiber treated with the same TAKEMOTO OIL & FAT CO LTD (JP) 1999-08-25 CN disclosed
US-5731037-A CONTROLLING SURFACE MOISTURE OF BUILDING MATERIAL KANSAI PAINT CO., LTD. (JP) 1998-03-24 US disclosed
US-4831091-A USING A COORDINATION CATALYST CONTAINING A SILANETRIOL OR -DIOL AS WELL AS AN AROMATIC ESTSER; ODORLESS; STEREOSPECIFIC; PARTICLE SIZES CHISSO CORPORATION (JP) 1989-05-16 US disclosed