Phthalic Acid

Phthalic Acid

SCHEMBL27716152

CC(=O)C(C)(O)C(O)C(O)C(O)CO.O=C(O)c1ccccc1C(=O)O

nearest known ligand 0.40

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
ALOX15 P16050 2/20 0.40
KMT2A Q03164 1/20 0.36
APEX1 P27695 1/20 0.36
KDM4E B2RXH2 2/20 0.35
TAAR1 Q96RJ0 1/20 0.35
MAPT P10636 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
CA12 O43570 2/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA4 P22748 2/20 0.35
CA7 P43166 2/20 0.35
CA9 Q16790 2/20 0.35
HTT P42858 1/20 0.35
USP2 O75604 1/20 0.35
TP53 P04637 1/20 0.35
TSHR P16473 2/20 0.34
AKR1C3 P42330 1/20 0.34
ESR1 P03372 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27944594 0.83 LMNA (0.40) KDM4EUSP2TDP1
SCHEMBL3959086 0.83 LMNA (0.40) KDM4EUSP2TDP1
SCHEMBL4655170 0.83 LMNA (0.40) KDM4EUSP2TDP1
Ammonia Solution, Strong SCHEMBL28207860 0.81 LMNA (0.39) KDM4EUSP2TDP1
Phthalic Acid SCHEMBL11511047 0.79 ALDH1A1 (0.58) ALDH1A1ALOX15KMT2AAPEX1KDM4E
Phthalic Acid SCHEMBL28441202 0.79 ALDH1A1 (0.58) ALDH1A1ALOX15KMT2AAPEX1KDM4E
Phthalic Acid SCHEMBL11508889 0.79 ALDH1A1 (0.58) ALDH1A1ALOX15KMT2AAPEX1KDM4E
Phthalic Acid SCHEMBL28438466 0.79 ALDH1A1 (0.58) ALDH1A1ALOX15KMT2AAPEX1KDM4E
Phthalic Acid SCHEMBL28446205 0.76 ALDH1A1 (0.64) ALDH1A1ALOX15KMT2AAPEX1KDM4E
Phthalic Acid SCHEMBL632002 0.73 ALDH1A1 (0.50) ALDH1A1ALOX15KMT2AAPEX1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101142525-A Pattern formation material, pattern formation device, and pattern formation method FUJI FILM CORP (JP) 2008-03-12 CN disclosed