SCHEMBL27737348

SCHEMBL27737348

C#CC(=O)Oc1ccccc1.[CsH]

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.47
THRB P10828 1/20 0.47
TDP1 Q9NUW8 2/20 0.44
ATM Q13315 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
ALOX15 P16050 2/20 0.42
HPGD P15428 1/20 0.42
HSD17B10 Q99714 1/20 0.42
MAPT P10636 2/20 0.40
KDM4E B2RXH2 1/20 0.40
NSD2 O96028 1/20 0.40
ELANE P08246 2/20 0.38
ALDH1A1 P00352 3/20 0.38
CYP19A1 P11511 1/20 0.38
MAOB P27338 1/20 0.38
CYP1A2 P05177 1/20 0.38
RAB9A P51151 1/20 0.37
RAD51 Q06609 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL505224 0.98 THRA (0.49) THRATHRBTDP1ATML3MBTL1
SCHEMBL9190844 0.96 THRA (0.47) THRATHRBTDP1ATML3MBTL1
SCHEMBL27737478 0.96 THRA (0.47) THRATHRBTDP1ATML3MBTL1
Tetramethylammonium Ion SCHEMBL27737350 0.90 THRB (0.47) THRATHRBTDP1ATML3MBTL1
SCHEMBL28140863 0.90 THRA (0.44) THRATHRBTDP1ATML3MBTL1
Guanidine SCHEMBL28536603 0.88 THRA (0.43) THRATHRBTDP1ATML3MBTL1
SCHEMBL162350 0.86 KMT2A (0.49) THRATHRBTDP1HSD17B10MAPT
Hydrochloric Acid SCHEMBL3857751 0.84 KMT2A (0.47) THRATHRBTDP1HSD17B10MAPT
SCHEMBL11011114 0.83 ELANE (0.62) TDP1ATML3MBTL1ELANEALDH1A1
SCHEMBL4544920 0.79 TDP1 (0.48) TDP1ATML3MBTL1ALOX15HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109563353-A Resin combination 东丽株式会社 2019-04-02 CN disclosed
CN-101263429-B pattern forming method using film-forming composition TOKYO OHKA KOGYO CO.,LTD. (JP) 2011-12-28 CN disclosed
CN-102257432-A Cationic radiation curable compositions AGFA GRAPHICS NV 2011-11-23 CN disclosed
CN-101263429-A Film-forming composition, pattern-forming method using the same, and three-dimensional mold TOKYO OHKA KOGYO CO LTD (JP) 2008-09-10 CN disclosed