Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 known ✓ | P00918 | 1/20 | 0.30 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.34 |
| ▸ | PEPD | P12955 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL203037 | 0.97 | — | — | |
| Fluoride SCHEMBL28844279 | 0.94 | TET2 (0.34) | TET2PEPDCA2 | |
| SCHEMBL28010953 | 0.94 | TET2 (0.34) | TET2PEPDCA2 | |
| Iodide SCHEMBL27914812 | 0.94 | TET2 (0.34) | TET2PEPDCA2 | |
| Bromide SCHEMBL27897349 | 0.94 | TET2 (0.34) | TET2PEPDCA2 | |
| Ammonia Solution, Strong SCHEMBL25206010 | 0.94 | TET2 (0.34) | TET2PEPDCA2 | |
| SCHEMBL8586407 | 0.94 | TET2 (0.34) | TET2PEPDCA2 | |
| Trifluoroacetic Acid SCHEMBL3183770 | 0.91 | TET2 (0.38) | TET2 | |
| Methacrylic Acid SCHEMBL15169467 | 0.86 | TDP1 (0.35) | TET2 | |
| Succinic Acid SCHEMBL23235006 | 0.84 | LMNA (0.45) | TET2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-61065237-A | — | — | None | — | — | JP | disclosed |
| US-20250180991-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-05 | — | — | US | disclosed |
| WO-2023171670-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-07 | — | — | US | disclosed |
| EP-3537217-B1 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORP (JP) | 2022-08-31 | — | — | EP | disclosed |
| US-20210317065-A1 | Method for Purifying Polymerizable Fluoromonomer by Distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-10-14 | — | — | US | disclosed |
| WO-2020035960-A1 | METHOD FOR PURIFYING POLYMERIZABLE FLUOROMONOMER BY DISTILLATION | セントラル硝子株式会社 | 2020-02-20 | — | — | WO | disclosed |
| EP-3537217-A2 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM Corporation (JP) | 2019-09-11 | — | — | EP | disclosed |
| EP-1795960-B1 | Positive resist composition, pattern forming method using the positive resist composition, use of the positive resit composition | FUJIFILM CORP (JP) | 2019-06-05 | — | — | EP | disclosed |
| CN-107021948-A | Homoadamantane derivative, process for producing the same, and photoresist composition | 大阪有机化学工业株式会社 | 2017-08-08 | — | — | CN | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| JP-2005325293-A | NEW COPOLYMER AND RESIST MATERIAL USING THE SAME | TOSOH CORP | 2005-11-24 | — | — | JP | disclosed |
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20050142487-A1 | Polymerizable adamantane derivative, production process thereof and polymeric compound | DAICEL CHEMICAL INDUSTRIES, LTD. | 2005-06-30 | — | — | US | disclosed |
| US-20050131247-A1 | Perfluoroadamantly acrylate compound and intermediate therefor | IDEMITDU PETROCHEMICAL CO., LTD (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050014092-A1 | Novel compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20050003303-A1 | Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| EP-1460057-A1 | PERFLUOROADAMANTYL ACRYLATE COMPOUND AND INTERMEDIATE THEREFOR | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2004-09-22 | — | — | EP | disclosed |
| JP-2002338522-A | METHOD FOR PRODUCING 2-ALKYL-2-ADAMANTYL α- TRIFLUOROMETHYLACRYLATE | NIPPON MEKTRON LTD | 2002-11-27 | — | — | JP | disclosed |
| JP-S6165237-A | RESIST MATERIAL | TOYO SODA MFG CO LTD | 1986-04-03 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050131247-A1 | Perfluoroadamantly acrylate compound and intermediate therefor | FFAR3, PFAS, FFAR1 | CA2 4495/4885TET2 1199/4885PEPD 4752/4885 |
| US-20250180991-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | VMA21, RER1, VMP1 | CA2 2489/4885TET2 4031/4885PEPD 4170/4885 |
| US-20210317065-A1 | Method for Purifying Polymerizable Fluoromonomer by Distillation | AFF1, AFF4, AFF2 | CA2 3497/4885TET2 25/4885PEPD 1289/4885 |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | CA2 4070/4885TET2 4290/4885PEPD 4637/4885 |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | AFF1, AFF4, AFF2 | CA2 3497/4885TET2 25/4885PEPD 1289/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.