Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.46 |
| ▸ | HTR2A | P28223 | 1/20 | 0.42 |
| ▸ | HTR2C | P28335 | 1/20 | 0.42 |
| ▸ | HTR2B | P41595 | 1/20 | 0.42 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1388099 | 0.87 | SIGMAR1 (0.55) | SIGMAR1HTR2AHTR2CHTR2BHRH3 | |
| SCHEMBL8527042 | 0.82 | ESR2 (0.40) | — | |
| SCHEMBL5709410 | 0.78 | SIGMAR1 (0.48) | SIGMAR1HTR2AHTR2CHTR2BHRH3 | |
| SCHEMBL13051102 | 0.78 | SIGMAR1 (0.48) | SIGMAR1HTR2AHTR2CHTR2BHRH3 | |
| SCHEMBL13906155 | 0.78 | SIGMAR1 (0.48) | SIGMAR1HTR2AHTR2CHTR2BHRH3 | |
| SCHEMBL28040971 | 0.78 | SIGMAR1 (0.48) | SIGMAR1HTR2AHTR2CHTR2BHRH3 | |
| SCHEMBL9134151 | 0.76 | KDM1A (0.52) | HTR2C | |
| SCHEMBL9134150 | 0.76 | KDM1A (0.52) | HTR2C | |
| SCHEMBL14804298 | 0.74 | HTR2A (0.54) | HTR2AHTR2CHTR2BHRH3 | |
| SCHEMBL4060712 | 0.72 | SIGMAR1 (0.56) | SIGMAR1HTR2AHTR2CHTR2BHRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-220818346-U | Industrial production system of 1, 1-di (4-hydroxyphenyl) -3-phenylindane | 江苏鸣翔化工有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-220818346-U | Industrial production system of 1, 1-di (4-hydroxyphenyl) -3-phenylindane | 江苏鸣翔化工有限公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-220818346-U | Industrial production system of 1, 1-di (4-hydroxyphenyl) -3-phenylindane | 江苏鸣翔化工有限公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-220818346-U | Industrial production system of 1, 1-di (4-hydroxyphenyl) -3-phenylindane | 江苏鸣翔化工有限公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-220257207-U | Dehydration dehydrogenation adaptation crystallization reaction kettle | 江苏鸣翔化工有限公司 | 2023-12-29 | — | — | CN | disclosed |
| CN-109804310-B | Negative photosensitive resin composition, cured film, element and display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114460809-A | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-05-10 | — | — | CN | disclosed |
| CN-108885399-B | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-03-15 | — | — | CN | disclosed |
| CN-108027561-B | Negative photosensitive resin composition, cured film, element and display device provided with cured film, and method for producing same | 东丽株式会社 | 2021-10-08 | — | — | CN | disclosed |
| CN-108027561-A | Negative light-sensitive resin combination, cured film, the element for possessing cured film and display device and its manufacture method | 东丽株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-101622236-A | Novel epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition | ADEKA CORP | 2010-01-06 | — | — | CN | disclosed |