SCHEMBL27803943

SCHEMBL27803943

[N-]=[N+]=NCC(N=[N+]=[N-])Oc1ccc(N=Nc2ccccc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CHRNA7 P36544 1/20 0.37
▸ CHRNA10 Q9GZZ6 1/20 0.37
▸ CHRNA9 Q9UGM1 1/20 0.37
▸ ALDH1A1 P00352 2/20 0.34
▸ MEN1 O00255 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ MAPT P10636 1/20 0.33
▸ PKM P14618 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ NPC1 O15118 1/20 0.33
▸ PPARA Q07869 2/20 0.32
▸ GPR88 Q9GZN0 1/20 0.32
▸ PPARG P37231 1/20 0.30
▸ PPARD Q03181 1/20 0.30
▸ TSHR P16473 1/20 0.30
▸ MAPK1 P28482 1/20 0.30
▸ HSD17B10 Q99714 1/20 0.30
▸ TDP1 Q9NUW8 1/20 0.30
▸ TRPA1 O75762 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14216605 0.66 PDE2A (0.37) PPARAGPR88PPARG
SCHEMBL28592298 0.65 GPR88 (0.34) ALDH1A1PPARAGPR88PPARG
SCHEMBL22721405 0.64 CHRNA7 (0.47) CHRNA7CHRNA10CHRNA9ALDH1A1MEN1
Azobenzene SCHEMBL31207795 0.63 ALDH1A1 (0.75) ALDH1A1MEN1KMT2AMAPTPKM
SCHEMBL12693824 0.63 ALDH1A1 (0.46) CHRNA7CHRNA10CHRNA9ALDH1A1MEN1
SCHEMBL18107962 0.63 L3MBTL1 (0.40) GPR88
SCHEMBL9224158 0.63 MEN1 (0.47) CHRNA7CHRNA10CHRNA9ALDH1A1MEN1
SCHEMBL3483448 0.63 SLC2A1 (0.40) CHRNA7CHRNA10CHRNA9ALDH1A1MEN1
SCHEMBL3483450 0.63 SLC2A1 (0.40) CHRNA7CHRNA10CHRNA9ALDH1A1MEN1
SCHEMBL17513820 0.63 ALDH1A1 (0.57) CHRNA7CHRNA10CHRNA9ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101981505-A Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate FUJIFILM CORP 2011-02-23 — — CN disclosed
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