Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 3/20 | 0.52 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.45 |
| ▸ | HPGD | P15428 | 3/20 | 0.45 |
| ▸ | GLA | P06280 | 2/20 | 0.45 |
| ▸ | CASP1 | P29466 | 2/20 | 0.45 |
| ▸ | CASP7 | P55210 | 2/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | MAOA | P21397 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5707682 | 0.81 | ALDH1A1 (0.46) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 | |
| SCHEMBL11501462 | 0.80 | SMN1; SMN2 (0.45) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 | |
| SCHEMBL13382365 | 0.73 | ALDH1A1 (0.57) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 | |
| SCHEMBL19609002 | 0.72 | KMT2A (0.53) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 | |
| SCHEMBL3787333 | 0.72 | DPP4 (0.73) | DPP4LOXL2NOS3NOS1NOS2 | |
| SCHEMBL1502392 | 0.72 | ALDH1A1 (0.62) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 | |
| SCHEMBL4005894 | 0.71 | DPP4 (0.41) | DPP4LOXL2ALDH1A1SMN1; SMN2LMNA | |
| SCHEMBL12187271 | 0.71 | HTR2A (0.58) | DPP4LOXL2ALDH1A1SMN1; SMN2LMNA | |
| SCHEMBL19608972 | 0.71 | ADORA2A (0.56) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 | |
| SCHEMBL13192514 | 0.71 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2LMNAMAPTCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| CN-101525392-A | 9-phenylacridine photoinitiator and preparation method thereof | UNIV JIANGSU POLYTECHNIC | 2009-09-09 | — | — | CN | claimed |
| CN-106909026-B | A kind of anti-corrosion agent composition that can directly describe exposure image and resist layer laminate | 苏州福斯特光伏材料有限公司 | 2019-11-22 | — | — | CN | disclosed |
| CN-110446976-A | Photosensitive resin composition | ASAHI CHEMICAL IND | 2019-11-12 | — | — | CN | disclosed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | disclosed |
| CN-109690404-A | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN LAMINATE | 旭化成株式会社 | 2019-04-26 | — | — | CN | disclosed |
| CN-108469717-A | Photosensitive polymer combination and photoresist laminated body | 旭化成株式会社 | 2018-08-31 | — | — | CN | disclosed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | disclosed |
| CN-107407880-A | Photosensitive resin composition | 旭化成株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-106909026-A | A kind of anti-corrosion agent composition and resist layer laminate that can directly describe exposure image | 苏州福斯特光伏材料有限公司 | 2017-06-30 | — | — | CN | disclosed |
| CN-102844709-A | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-102341753-A | Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same | HITACHI CHEMICAL CO LTD | 2012-02-01 | — | — | CN | disclosed |
| CN-101449208-B | Photosensitive resin composition and laminate | ASAHI KASEI E-MATERIALS CORP. (JP) | 2011-12-14 | — | — | CN | disclosed |
| CN-102037406-A | Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2011-04-27 | — | — | CN | disclosed |
| CN-101525392-B | 9-phenylacridine photoinitiator and preparation method thereof | UNIV JIANGSU POLYTECHNIC | 2011-03-16 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| CN-101568882-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-10-28 | — | — | CN | disclosed |
| CN-101525392-A | 9-phenylacridine photoinitiator and preparation method thereof | UNIV JIANGSU POLYTECHNIC | 2009-09-09 | — | — | CN | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |