SCHEMBL27818005

SCHEMBL27818005

C=C(C)C(=O)OCCC(=O)OC1CCCC1

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ NAAA Q02083 2/20 0.49
▸ THRB P10828 1/20 0.42
▸ TSHR P16473 4/20 0.41
▸ EPHX1 P07099 2/20 0.41
▸ ALDH1A1 P00352 3/20 0.40
▸ HTT P42858 2/20 0.40
▸ CYP19A1 P11511 3/20 0.39
▸ CYP2C19 P33261 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ LMNA P02545 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ POLB P06746 1/20 0.33
▸ APEX1 P27695 1/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25239579 0.98 NAAA (0.50) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL13475729 0.89 NAAA (0.48) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL15449223 0.87 NAAA (0.52) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL11509591 0.83 THRB (0.49) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL29544358 0.83 NAAA (0.44) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL10073431 0.83 THRB (0.43) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL21420092 0.82 NAAA (0.45) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL952699 0.81 NAAA (0.41) NAAATHRBTSHREPHX1ALDH1A1
SCHEMBL12360321 0.81 THRB (0.38) NAAATHRBTSHRALDH1A1HTT
SCHEMBL13401004 0.80 TSHR (0.49) NAAATHRBTSHRALDH1A1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104115067-B Negative light-sensitive resin combination, cured film and touch panel component 东丽株式会社 2017-09-22 — — CN disclosed
CN-107107542-A Laminated substrate, glass cover-plate, the manufacture method of contact panel and laminated substrate 东丽株式会社 2017-08-29 — — CN disclosed
CN-104903092-B Substrate and use its touch panel component 东丽株式会社 2016-09-07 — — CN disclosed
CN-105911819-A Photoresist composition, hardening film making method, hardening film and application thereof 富士胶片株式会社 2016-08-31 — — CN disclosed
CN-104903091-B Substrate and use its touch panel component 东丽株式会社 2016-08-17 — — CN disclosed
CN-102621807-B Anti-corrosion agent composition, resist pattern formation method TOKYO OHKA KOGYO CO., LTD. (JP) 2016-05-25 — — CN disclosed
CN-104271345-B Substrate and the contact panel parts using it TORAY INDUSTRIES, INC. (JP) 2016-03-23 — — CN disclosed
CN-102844708-B Negative light-sensitive resin combination, the diaphragm using said composition and touch panel component TORAY INDUSTRIES, INC. (JP) 2015-11-25 — — CN disclosed
CN-104903091-A SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES 2015-09-09 — — CN disclosed
CN-104903092-A Substrate and touch panel member using same TORAY INDUSTRIES 2015-09-09 — — CN disclosed
CN-104271345-A Substrate and touch panel member using same TORAY INDUSTRIES 2015-01-07 — — CN disclosed
CN-104115067-A Negative photosensitive resin composition, cured film, and member for touch panel TORAY INDUSTRIES 2014-10-22 — — CN disclosed
CN-102150083-B Radiation-sensitive resin composition, and resist pattern formation method JSR CORP 2013-09-04 — — CN disclosed
CN-102844708-A Negative photosensitive resin composition, and protective film and touch panel member using the same TORAY INDUSTRIES 2012-12-26 — — CN disclosed
CN-102621807-A Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO LTD 2012-08-01 — — CN disclosed
CN-102150083-A Radiation-sensitive resin composition, and resist pattern formation method JSR CORP 2011-08-10 — — CN disclosed
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