Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | TYR | P14679 | 4/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.54 |
| ▸ | MIF | P14174 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | ATP2A2 | P16615 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | ATP2A3 | Q93084 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 5/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375548 | 1.00 | ALDH1A1 (0.54) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL3653311 | 0.89 | ALDH1A1 (0.48) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL4064869 | 0.89 | ESR1 (0.56) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL8977698 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL8644897 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL29372571 | 0.87 | ESR1 (0.60) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL18044792 | 0.87 | TYR (0.47) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL246193 | 0.87 | ESR1 (0.60) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL687438 | 0.86 | ALDH1A1 (0.50) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL9273606 | 0.86 | TYR (0.42) | ALDH1A1TYRALOX15HSD17B10LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 556 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| US-5407780-A | High sensitivity, resolution and heat resistance | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-18 | — | — | US | claimed |
| US-5288587-A | Novolaks; improved resolution and heat resistance | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-02-22 | — | — | US | claimed |
| US-5080997-A | PROCESS FOR PREPARING A POSITIVE RESIST COMPOSITION BY MIXING THE CONDENSATION PRODUCT OF A QUINONE DIAZIDE SULFONYL HALOGENIDE AND A PHENOL WITH A RESIN SOLUTION WITHOUT ISOLATING THE CONDENSATION PRODUCT FROM THE CRUDE MIXTURE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-01-14 | — | — | US | claimed |
| US-5059507-A | Which is sensitive to ultraviolet rays and x-rays | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-10-22 | — | — | US | claimed |
| JP-8245515-A | — | — | None | — | — | JP | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| WO-2025013535-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-01-16 | — | — | WO | disclosed |
| US-20240270891-A1 | PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN | DIC CORPORATION (JP) | 2024-08-15 | — | — | US | disclosed |
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-114902135-B | Positive photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2024-07-02 | — | — | CN | disclosed |
| WO-2024135575-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2024-06-27 | — | — | WO | disclosed |
| EP-0214152-A1 | CROSS-LINKABLE COMPOSITIONS CONTAINING NON-NEWTONIAN COLLOIDAL DISPERSE SYSTEMS | The Lubrizol Corporation (US) | 1987-03-18 | — | — | EP | disclosed |
| WO-1986004597-A1 | CROSS-LINKABLE COMPOSITIONS CONTAINING NON-NEWTONIAN COLLOIDAL DISPERSE SYSTEMS | THE LUBRIZOL CORPORATION (US) | 1986-08-14 | — | — | WO | disclosed |
| US-4591612-A | HIGH SOLIDS COATING COMPOSITION | THE LUBRIZOL CORPORATION (US) | 1986-05-27 | — | — | US | disclosed |
| EP-0104017-A2 | Curable epoxy resin compositions | The Lubrizol Corporation (US) | 1984-03-28 | — | — | EP | disclosed |
| US-4439594-A | ZINC PHOSPHORODITHIOATE CURING AGENT | THE LUBRIZOL CORPORATION (US) | 1984-03-27 | — | — | US | disclosed |
| US-RE31543-E | EPOXIDE, SILOXANE, ALUMINUM CATALYST | DOW CORNING CORPORATION (US) | 1984-03-27 | — | — | US | disclosed |
| US-4082719-A | ORGANOSILICON AND ALUMINUM COMPOUNDS, CURING CATALYST | DOW CORNING CORPORATION (US) | 1978-04-04 | — | — | US | disclosed |
| US-3971747-A | ORGANO-SILICON, EPOXIDE, ALUMINUM CONTAINING CATALYST | DOW CORNING CORPORATION (US) | 1976-07-27 | — | — | US | disclosed |