Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | TYR | P14679 | 4/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.54 |
| ▸ | MIF | P14174 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | ATP2A2 | P16615 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | ATP2A3 | Q93084 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 5/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL278382 | 1.00 | ALDH1A1 (0.54) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL3653311 | 0.89 | ALDH1A1 (0.48) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL4064869 | 0.89 | ESR1 (0.56) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL8977698 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL8644897 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL29372571 | 0.87 | ESR1 (0.60) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL18044792 | 0.87 | TYR (0.47) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL246193 | 0.87 | ESR1 (0.60) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL687438 | 0.86 | ALDH1A1 (0.50) | ALDH1A1TYRALOX15HSD17B10LMNA | |
| SCHEMBL9273606 | 0.86 | TYR (0.42) | ALDH1A1TYRALOX15HSD17B10LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120077104-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119998728-A | Film manufacturing method, photosensitive resin composition, cured product manufacturing method, cured product, and laminate | 富士胶片株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-119968421-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-119731595-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2025-03-28 | — | — | CN | disclosed |
| CN-119731225-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2025-03-28 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-119452307-A | Resist auxiliary film composition and pattern forming method using the same | 三菱瓦斯化学株式会社 | 2025-02-14 | — | — | CN | disclosed |
| CN-119422108-A | Resist composition and method for forming resist film using same | 三菱瓦斯化学株式会社 | 2025-02-11 | — | — | CN | disclosed |
| CN-119361563-A | Laminate and method for manufacturing electronic component | 东京应化工业株式会社 | 2025-01-24 | — | — | CN | disclosed |
| WO-2022239597-A1 | RESIN CONTAINING PHENOLIC HYDROXYL GROUP | DIC株式会社 | 2022-11-17 | — | — | WO | disclosed |
| CN-108884574-B | Coating agent for forming metal oxide film and method for producing substrate having metal oxide film | 东京应化工业株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-114967341-A | Positive photosensitive resin composition for low-temperature process and method for producing resist film | 新应材股份有限公司 | 2022-08-30 | — | — | CN | disclosed |
| CN-114902135-A | Positive photosensitive resin composition, cured film and resist film | DIC株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-107870516-B | Positive photosensitive resin composition, patterned film and method for manufacturing bump | 奇美实业股份有限公司 | 2022-08-02 | — | — | CN | disclosed |
| CN-114326300-A | Positive photoresist composition, preparation method and photoresist pattern forming method | 上海飞凯材料科技股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-114303096-A | Film-forming composition for lithography, resist pattern formation method, circuit pattern formation method, and purification method | 三菱瓦斯化学株式会社 | 2022-04-08 | — | — | CN | disclosed |
| CN-107703685-B | Laminate and method for producing laminate | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-107179652-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2022-02-08 | — | — | CN | disclosed |