Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.59 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.59 |
| ▸ | THRA | P10827 | 5/20 | 0.45 |
| ▸ | THRB | P10828 | 5/20 | 0.45 |
| ▸ | SHBG | P04278 | 1/20 | 0.39 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CA4 | P22748 | 1/20 | 0.37 |
| ▸ | CA6 | P23280 | 1/20 | 0.37 |
| ▸ | NQO1 | P15559 | 2/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.37 |
| ▸ | AR | P10275 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | DBH | P09172 | 1/20 | 0.35 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.35 |
| ▸ | CETP | P11597 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30003150 | 1.00 | ESR1 (0.59) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL12039671 | 0.97 | ESR1 (0.56) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL7527388 | 0.97 | ESR1 (0.59) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL278500 | 0.93 | ESR1 (0.51) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL5673195 | 0.87 | ESR1 (0.63) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL2618671 | 0.84 | SHBG (0.48) | ESR1ESR2SHBGTP53CA1 | |
| SCHEMBL7526030 | 0.84 | ESR1 (0.59) | ESR1ESR2THRATHRBAMY1A | |
| SCHEMBL278558 | 0.83 | ESR1 (0.43) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL30004194 | 0.83 | ESR1 (0.43) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL1275991 | 0.83 | CDK1 (0.47) | ESR1ESR2THRATHRBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| EP-3498788-B1 | SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS | AGFA GEVAERT NV (BE) | 2023-05-03 | — | — | EP | disclosed |
| EP-3896522-B1 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-20220411654-A1 | Radiation Curable Inkjet Ink for Manufacturing Printed Circuit Boards | AGFA-GEVAERT NV (BE) | 2022-12-29 | — | — | US | disclosed |
| US-11487200-B2 | Positive-type photosensitive resin composition and cured film prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. | 2022-11-01 | — | — | US | disclosed |
| EP-3961676-A1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-02 | — | — | EP | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0744661-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1998-10-07 | — | — | EP | disclosed |
| US-5750310-A | BLEND OF ALKALI SOLUBLE RESIN, 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID AND TETRAHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-12 | — | — | US | disclosed |
| US-5747218-A | NAPHTHOQUINONEDIAZIDE SULFONIC ACID TETRAESTER OF POLYHYDROXYPOLYPHENOLS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-05 | — | — | US | disclosed |
| US-5667932-A | NAPHTHOQUINONEDIAZIDE SULFONIC ESTER OF POLYHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| EP-0740213-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |