Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.43 |
| ▸ | THRA | P10827 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | SHBG | P04278 | 1/20 | 0.37 |
| ▸ | IDH1 | O75874 | 2/20 | 0.36 |
| ▸ | SLC28A3 | Q9HAS3 | 1/20 | 0.36 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.35 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | ERAP1 | Q9NZ08 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30004194 | 1.00 | ESR1 (0.43) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL12808622 | 0.95 | THRA (0.40) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL22271537 | 0.94 | KDM4E (0.43) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL278497 | 0.92 | AMY1A (0.45) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL278508 | 0.91 | AMY1A (0.44) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL327957 | 0.89 | AMY1A (0.45) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL2788843 | 0.86 | ESR1 (0.46) | ESR1ESR2THRATHRBKEAP1 | |
| SCHEMBL2618671 | 0.84 | SHBG (0.48) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL30003150 | 0.83 | ESR1 (0.59) | ESR1ESR2THRATHRBSHBG | |
| SCHEMBL278559 | 0.83 | ESR1 (0.59) | ESR1ESR2THRATHRBSHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 161 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| US-6905809-B2 | Photoresist compositions | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-14 | — | — | US | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| JP-9110761-A | — | — | None | — | — | JP | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| EP-4066059-B1 | CHEMICALLY AMPLIFIED PHOTORESIST | MERCK PATENT GMBH (DE) | 2024-02-28 | — | — | EP | disclosed |
| US-11859100-B2 | Surface coating compositions | MERCK PATENT GMBH (DE) | 2024-01-02 | — | — | US | disclosed |
| US-11859100-B2 | Surface coating compositions | MERCK PATENT GMBH (DE) | 2024-01-02 | — | — | US | disclosed |
| US-5747218-A | NAPHTHOQUINONEDIAZIDE SULFONIC ACID TETRAESTER OF POLYHYDROXYPOLYPHENOLS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-05 | — | — | US | disclosed |
| US-5667932-A | NAPHTHOQUINONEDIAZIDE SULFONIC ESTER OF POLYHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| JP-H09110761-A | PRODUCTION OF TETRAPHENOL COMPOUND | SUMITOMO CHEM CO LTD | 1997-04-28 | — | — | JP | disclosed |
| EP-0744661-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-11-27 | — | — | EP | disclosed |
| EP-0740213-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0695740-A1 | Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-02-07 | — | — | EP | disclosed |