SCHEMBL30004194

SCHEMBL30004194

Cc1cc(Cc2cc(C)c(O)c(Cc3ccc(O)cc3)c2C)c(C)c(Cc2ccc(O)cc2)c1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.43
ESR2 Q92731 3/20 0.43
THRA P10827 1/20 0.43
THRB P10828 1/20 0.43
KEAP1 Q14145 1/20 0.38
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
SHBG P04278 1/20 0.37
IDH1 O75874 2/20 0.36
SLC28A3 Q9HAS3 1/20 0.36
TMEM97 Q5BJF2 1/20 0.35
SIGMAR1 Q99720 1/20 0.35
PTGS1 P23219 1/20 0.35
PTGS2 P35354 1/20 0.35
KDM4E B2RXH2 1/20 0.35
GLA P06280 1/20 0.35
GAA P10253 1/20 0.35
HSD17B3 P37058 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
ERAP1 Q9NZ08 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278558 1.00 ESR1 (0.43) ESR1ESR2THRATHRBKEAP1
SCHEMBL12808622 0.95 THRA (0.40) ESR1ESR2THRATHRBKEAP1
SCHEMBL22271537 0.94 KDM4E (0.43) ESR1ESR2THRATHRBKEAP1
SCHEMBL278497 0.92 AMY1A (0.45) ESR1ESR2THRATHRBKEAP1
SCHEMBL278508 0.91 AMY1A (0.44) ESR1ESR2THRATHRBKEAP1
SCHEMBL327957 0.89 AMY1A (0.45) ESR1ESR2THRATHRBKEAP1
SCHEMBL2788843 0.86 ESR1 (0.46) ESR1ESR2THRATHRBKEAP1
SCHEMBL2618671 0.84 SHBG (0.48) ESR1ESR2SHBGPTGS1PTGS2
SCHEMBL30003150 0.83 ESR1 (0.59) ESR1ESR2THRATHRBSHBG
SCHEMBL278559 0.83 ESR1 (0.59) ESR1ESR2THRATHRBSHBG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119620544-A Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2025-03-14 CN disclosed
CN-118295211-A Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board 深圳市容大感光科技股份有限公司 2024-07-05 CN disclosed
CN-117939914-A Structure, display element, pattern for partition wall, and method for forming the same 东京应化工业株式会社 2024-04-26 CN disclosed
CN-117850163-A Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board 深圳市容大感光科技股份有限公司 2024-04-09 CN disclosed
CN-111205648-B Curable composition, cured product, microlens, and optical element 东京应化工业株式会社 2023-12-08 CN disclosed
CN-116360213-A Resin composition and photoresist patterning method using the same 深圳市容大感光科技股份有限公司 2023-06-30 CN disclosed
CN-106933034-B Positive photoresist composition 东京应化工业株式会社 2023-01-06 CN disclosed
CN-108884574-B Coating agent for forming metal oxide film and method for producing substrate having metal oxide film 东京应化工业株式会社 2022-10-14 CN disclosed