SCHEMBL27875968

SCHEMBL27875968

C/C=C(/C)c1cccc(CCCC)c1

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ LPL P06858 2/20 0.46
▸ LIPG Q9Y5X9 2/20 0.46
▸ CYP4F2 P78329 2/20 0.44
▸ CYP4A11 Q02928 2/20 0.44
▸ SPHK2 Q9NRA0 1/20 0.43
▸ SPHK1 Q9NYA1 1/20 0.43
▸ PPARG P37231 2/20 0.43
▸ PPARA Q07869 2/20 0.43
▸ NPC1 O15118 1/20 0.42
▸ HPGD P15428 1/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ HTT P42858 1/20 0.42
▸ RAB9A P51151 1/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ XIAP P98170 1/20 0.40
▸ MAP1LC3B Q9GZQ8 1/20 0.39
▸ MAP1LC3A Q9H492 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16951379 0.84 LPL (0.50) LPLLIPGCYP4F2CYP4A11SPHK2
SCHEMBL27892628 0.82 BCL2 (0.42) CYP4F2CYP4A11
SCHEMBL27875954 0.82 HPGD (0.47) NPC1HPGDMAPK1HTTRAB9A
SCHEMBL8341269 0.81 CYP4F2 (0.53) LPLLIPGCYP4F2CYP4A11SPHK2
SCHEMBL12802707 0.81 LPL (0.47) LPLLIPGCYP4F2CYP4A11SPHK2
SCHEMBL16955228 0.80 THRA (0.47) LPLLIPGCYP4F2CYP4A11SPHK2
SCHEMBL16959566 0.79 CYP4F2 (0.48) LPLLIPGCYP4F2CYP4A11SPHK2
SCHEMBL11757933 0.79 CYP4F2 (0.54) LPLLIPGCYP4F2CYP4A11SPHK2
SCHEMBL28524593 0.78 THRA (0.56) HPGD
SCHEMBL27892537 0.78 THRA (0.56) HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102731722-A Process for producing modified conjugated diene-based polymer, modified conjugated diene-based polymer, and polymer composition SUMITOMO CHEMICAL CO 2012-10-17 — — CN disclosed
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