Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDH1 | O75874 | 1/20 | 0.65 |
| ▸ | BCL2 | P10415 | 1/20 | 0.58 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.58 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.57 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.52 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.52 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.52 |
| ▸ | HNF4A | P41235 | 1/20 | 0.50 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.50 |
| ▸ | MPO | P05164 | 1/20 | 0.49 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | CA4 | P22748 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formamide SCHEMBL28255494 | 0.88 | IDH1 (0.53) | IDH1BCL2BCL2L1CALM1PTPN1 | |
| SCHEMBL18604568 | 0.87 | PTPN1 (0.64) | IDH1BCL2BCL2L1CALM1PTPN1 | |
| SCHEMBL14549313 | 0.86 | IDH1 (0.55) | IDH1BCL2BCL2L1CALM1PTPN1 | |
| SCHEMBL11408792 | 0.84 | CA1 (0.52) | IDH1PTPN1ALOX15MEN1HPGD | |
| SCHEMBL31544990 | 0.84 | IDH1 (0.63) | IDH1BCL2BCL2L1CALM1PTPN1 | |
| SCHEMBL14621022 | 0.82 | TTR (0.53) | IDH1BCL2BCL2L1CALM1 | |
| SCHEMBL31545825 | 0.82 | IDH1 (0.61) | IDH1BCL2BCL2L1CALM1PTPN1 | |
| SCHEMBL28439714 | 0.82 | CALM1 (0.52) | IDH1BCL2BCL2L1CALM1PTPN1 | |
| SCHEMBL278270 | 0.81 | ESR1 (0.67) | IDH1ALOX15MEN1KMT2ACA1 | |
| SCHEMBL716420 | 0.81 | IGF1R (0.55) | IDH1BCL2BCL2L1ALOX15IGF1R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0299545-A2 | Branched polycarbonates containing tri-or tetra-hydroxy biphenil compounds, and process for preparing them | ENICHEM S.p.A. (IT) | 1989-01-18 | — | — | EP | claimed |
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20120156614-A1 | Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-06-21 | — | — | US | disclosed |
| US-20120156614-A1 | Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-06-21 | — | — | US | disclosed |
| US-8198006-B2 | Process for producing semiconductor device | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| US-5087548-A | POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., INC. (JP) | 1992-02-11 | — | — | US | disclosed |
| US-4900803-A | Branched polycarbonate from tri- or tetra-hydroxy biphenyl compounds | ENICHEM TECNORESINE S.P.A. (IT) | 1990-02-13 | — | — | US | disclosed |
| EP-0299545-A2 | Branched polycarbonates containing tri-or tetra-hydroxy biphenil compounds, and process for preparing them | ENICHEM S.p.A. (IT) | 1989-01-18 | — | — | EP | disclosed |
| EP-0227487-A2 | Positive type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-07-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120156614-A1 | Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same | SUN2, TYR, PSMD2 | IDH1 4667/4885BCL2 4508/4885BCL2L1 3212/4885 |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | CD79B, BRIX1, SMARCB1 | IDH1 2727/4885BCL2 4701/4885BCL2L1 4643/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.