Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | G6PD | P11413 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | CCR6 | P51684 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | ESR1 | P03372 | 2/20 | 0.42 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18121260 | 0.84 | AMY1A (0.39) | CYP2D6CYP2C9CYP2C19HIF1AHSD17B10 | |
| SCHEMBL224889 | 0.84 | ALDH1A1 (0.52) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL29713830 | 0.84 | ALDH1A1 (0.52) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL278392 | 0.81 | AMY1A (0.42) | ESR1ESR2AMY1A | |
| SCHEMBL18121261 | 0.81 | HIF1A (0.42) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL4064013 | 0.80 | AMY1A (0.41) | MAPTESR1ESR2AMY1ACETP | |
| SCHEMBL29368767 | 0.79 | HSPA5 (0.43) | CYP2C9CYP2C19HIF1ACYP3A4MAPT | |
| SCHEMBL35864 | 0.79 | HSPA5 (0.43) | CYP2C9CYP2C19HIF1ACYP3A4MAPT | |
| SCHEMBL28693858 | 0.79 | ESR2 (0.45) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL14181474 | 0.78 | ALDH1A1 (0.46) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0695740-B1 | Quinonediazide sulfonic acid esters and positive photoresist compositions comprising the same | SUMITOMO CHEMICAL CO (JP) | 2000-11-22 | — | — | EP | claimed |
| EP-0695740-A1 | Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-02-07 | — | — | EP | claimed |
| JP-8099922-A | — | — | None | — | — | JP | disclosed |
| US-9740097-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9740097-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160291466-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291466-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| EP-0769485-B1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL CO (JP) | 2002-03-13 | — | — | EP | disclosed |
| US-6300033-B1 | CRESOL OR 2,5-XYLENOL-FORMALDEHYDE PHENOLIC RESIN; QUINONE DIAZIDE ESTER PHOTOSENSITIZER; FOCAL DEPTH | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-10-09 | — | — | US | disclosed |
| EP-0695740-B1 | Quinonediazide sulfonic acid esters and positive photoresist compositions comprising the same | SUMITOMO CHEMICAL CO (JP) | 2000-11-22 | — | — | EP | disclosed |
| US-5866724-A | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-02 | — | — | US | disclosed |
| US-5726217-A | PHOTOSENSITIZERS FOR POSITIVE RESISTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-10 | — | — | US | disclosed |
| EP-0769485-A1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-23 | — | — | EP | disclosed |
| JP-H0899922-A | POLYHYDRIC PHENOL COMPOUND, ITS PRODUCTION AND USE | SUMITOMO CHEM CO LTD | 1996-04-16 | — | — | JP | disclosed |
| EP-0695740-A1 | Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-02-07 | — | — | EP | disclosed |
| EP-0695740-A1 | Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-02-07 | — | — | EP | disclosed |