SCHEMBL278889

SCHEMBL278889

O=C(O)c1ccc(-n2nnnc2S)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.52
PTGS2 P35354 1/20 0.49
ALDH1A1 P00352 6/20 0.47
MEN1 O00255 4/20 0.47
KMT2A Q03164 4/20 0.47
MAPK1 P28482 1/20 0.47
PPARG P37231 1/20 0.47
HTT P42858 2/20 0.46
LMNA P02545 2/20 0.46
TP53 P04637 1/20 0.46
MAPT P10636 1/20 0.46
GFER P55789 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
EP300 Q09472 1/20 0.44
NPSR1 Q6W5P4 1/20 0.43
RECQL P46063 1/20 0.43
POLB P06746 1/20 0.43
TSHR P16473 1/20 0.43
MAOA P21397 1/20 0.42
MAOB P27338 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5094713 0.98 HPGD (0.51) HPGDPTGS2ALDH1A1MEN1KMT2A
SCHEMBL3294203 0.85 TSHR (0.51) HPGDPTGS2ALDH1A1MEN1KMT2A
SCHEMBL14655688 0.85 ALDH1A1 (0.53) HPGDALDH1A1MEN1KMT2AMAPK1
SCHEMBL5094710 0.83 HPGD (0.40) HPGDALDH1A1MAPK1HTTLMNA
SCHEMBL8655762 0.83 ALDH1A1 (0.41) HPGDALDH1A1MEN1KMT2AHTT
SCHEMBL4279193 0.83 TP53 (0.42) HPGDALDH1A1MEN1KMT2AMAPK1
SCHEMBL8021678 0.81 TP53 (0.60) HPGDALDH1A1MEN1KMT2ATP53
SCHEMBL6262563 0.81 ALDH1A1 (0.66) HPGDALDH1A1KMT2AMAPK1HTT
SCHEMBL4138869 0.81 HPGD (0.54) HPGDPTGS2ALDH1A1MEN1KMT2A
SCHEMBL13297728 0.80 ALDH1A1 (0.41) HPGDPTGS2ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 501 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4652981-A1 RADIATION-CURABLE COMPOSITION FOR THE PRODUCTION OF DENTAL COMPONENTS Kulzer GmbH (DE) 2025-11-26 EP claimed
CN-118871861-A Dry film resist, photosensitive dry film and copper-clad plate 杭州福斯特电子材料有限公司 2024-10-29 CN claimed
CN-114921821-B Electroplating device for filling holes of through holes and TGV/TCV hole metallization method 电子科技大学 2023-05-16 CN claimed
CN-114921821-A Electroplating device for filling through hole and TGV/TCV hole metallization method 电子科技大学 2022-08-19 CN claimed
CN-114660895-A Dry film resist, photosensitive dry film and copper-clad plate 杭州福斯特电子材料有限公司 2022-06-24 CN claimed
EP-2071057-B1 ELECTROPLATING COPPER-TIN ALLOY ROHM & HAAS ELECT MAT (US) 2019-01-23 EP claimed
EP-3004429-B1 ELECTROPLATING BATHS OF SILVER AND TIN ALLOYS ROHM & HAAS ELECT MAT (US) 2018-07-18 EP claimed
US-9765288-B2 Compositions for cleaning III-V semiconductor materials and methods of using same ENTEGRIS, INC. (US) 2017-09-19 US claimed
US-9512529-B2 Electroplating baths of silver and tin alloys ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-12-06 US claimed
US-20150344825-A1 COMPOSITIONS FOR CLEANING III-V SEMICONDUCTOR MATERIALS AND METHODS OF USING SAME TRUIST BANK, AS NOTES COLLATERAL AGENT 2015-12-03 US claimed
WO-2014089196-A1 COMPOSITIONS FOR CLEANING III-V SEMICONDUCTOR MATERIALS AND METHODS OF USING SAME ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-06-12 WO claimed
CN-101514465-B Bronze electroplating ROHM & HAAS ELECT MAT 2011-05-25 CN claimed
US-7780839-B2 Electroplating bronze ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-08-24 US claimed
EP-0754967-A1 Photographic direct positive material containing a particular stabilizer AGFA-GEVAERT N.V. (BE) 1997-01-22 EP claimed
US-5126229-A No background contamination FUJI PHOTO FILM CO., LTD. (JP) 1992-06-30 US claimed
US-12503636-B2 Corrosion inhibitor composition for wet sour crude KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) 2025-12-23 US disclosed
EP-4652981-A1 RADIATION-CURABLE COMPOSITION FOR THE PRODUCTION OF DENTAL COMPONENTS Kulzer GmbH (DE) 2025-11-26 EP disclosed
US-4518685-A BLOCKED AGENT FOR STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1985-05-21 US disclosed
EP-0125523-A2 Silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1984-11-21 EP disclosed
EP-0117511-A2 Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1984-09-05 EP disclosed