⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28010936 | 0.74 | — | — | |
| SCHEMBL3381875 | 0.74 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL3379499 | 0.73 | SMN1; SMN2 (0.33) | — | |
| SCHEMBL9103504 | 0.72 | — | — | |
| SCHEMBL10322877 | 0.72 | — | — | |
| SCHEMBL13719266 | 0.72 | — | — | |
| SCHEMBL1011271 | 0.72 | SHBG (0.30) | — | |
| SCHEMBL15375792 | 0.71 | — | — | |
| SCHEMBL11727894 | 0.71 | EPHX1 (0.44) | — | |
| SCHEMBL3381889 | 0.70 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110320755-A | Minus white photosensitive resin composition and its application | 奇美实业股份有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-105093832-B | Photosensitive composition, protective film and element having protective film | 奇美实业股份有限公司 | 2019-08-30 | — | — | CN | disclosed |
| CN-104423170-B | Photosensitive polysiloxane composition, protective film and assembly with protective film | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-104345567-B | photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2019-04-02 | — | — | CN | disclosed |
| CN-109116681-A | Chemically amplified positive photosensitive resin composition, photoresist pattern and method for forming the same, and electronic device | 奇美实业股份有限公司 | 2019-01-01 | — | — | CN | disclosed |
| CN-109062007-A | positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-104423168-B | Positive photosensitive resin composition and pattern forming method thereof | 奇美实业股份有限公司 | 2018-11-30 | — | — | CN | disclosed |
| CN-108693710-A | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| CN-105733439-B | Photocurable coating composition, photocurable coating film, and touch panel | 奇美实业股份有限公司 | 2018-07-31 | — | — | CN | disclosed |
| CN-104945908-B | Curable resin composition and use thereof | 奇美实业股份有限公司 | 2018-04-24 | — | — | CN | disclosed |
| CN-104345567-A | Photosensitive polysiloxane composition and application thereof | CHI MEI CORP | 2015-02-11 | — | — | CN | disclosed |
| CN-104345554-A | Photosensitive resin composition, color filter and liquid crystal display element thereof | CHI MEI CORP | 2015-02-11 | — | — | CN | disclosed |
| CN-104122753-A | Photosensitive polysiloxane composition, protective film and element with protective film | CHI MEI CORP | 2014-10-29 | — | — | CN | disclosed |
| CN-104076608-A | Photosensitive resin composition, white matrix, filter and display module | CHI MEI CORP | 2014-10-01 | — | — | CN | disclosed |
| CN-103901728-A | Photosensitive polysiloxane composition and application thereof | CHI MEI CORP | 2014-07-02 | — | — | CN | disclosed |
| CN-103483753-A | Curable resin composition, protective film and liquid crystal display element containing the protective film | CHI MEI CORP | 2014-01-01 | — | — | CN | disclosed |
| CN-103424990-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI CORP | 2013-12-04 | — | — | CN | disclosed |
| CN-103376661-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI COR | 2013-10-30 | — | — | CN | disclosed |
| CN-103365093-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI CORP | 2013-10-23 | — | — | CN | disclosed |
| CN-103135355-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI CORP | 2013-06-05 | — | — | CN | disclosed |