Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7778762 | 0.93 | CA1 (0.52) | ALDH1A1CA1CA9TSHRLMNA | |
| Butyrolactone SCHEMBL29006003 | 0.86 | CA1 (0.45) | ALDH1A1CA1CA9TSHRLMNA | |
| SCHEMBL9507265 | 0.82 | ALDH1A1 (0.56) | ALDH1A1TSHRKMT2AATM | |
| Methacrylic Acid SCHEMBL212354 | 0.82 | CA1 (0.52) | ALDH1A1CA1CA9TSHRLMNA | |
| SCHEMBL424253 | 0.80 | CA1 (0.52) | ALDH1A1CA1CA9TSHRLMNA | |
| Butyrolactone SCHEMBL22126130 | 0.80 | CA1 (0.54) | ALDH1A1CA1CA9TSHRLMNA | |
| Butyrolactone SCHEMBL7650673 | 0.79 | CA1 (0.64) | ALDH1A1CA1CA9TSHRLMNA | |
| SCHEMBL17867649 | 0.79 | CA1 (0.50) | ALDH1A1CA1CA9TSHRLMNA | |
| Acetic Acid Methyl Ester SCHEMBL4875961 | 0.78 | CA1 (0.64) | ALDH1A1CA1CA9TSHRLMNA | |
| SCHEMBL29036832 | 0.78 | ALDH1A1 (0.60) | ALDH1A1TSHRLMNAKMT2AATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113861332-B | Photoresist resin and polymerization method thereof | 宁波南大光电材料有限公司 | 2023-02-24 | — | — | CN | claimed |
| CN-113861332-B | Photoresist resin and polymerization method thereof | 宁波南大光电材料有限公司 | 2023-02-24 | — | — | CN | disclosed |
| CN-113861332-A | Photoresist resin and polymerization method thereof | 宁波南大光电材料有限公司 | 2021-12-31 | — | — | CN | disclosed |
| CN-111788526-A | Material for pattern formation, method for pattern formation, and single body for pattern formation material | 王子控股株式会社 | 2020-10-16 | — | — | CN | disclosed |
| CN-103772252-A | Novel onium salt compound, acid amplifier derived therefrom, and resist composition comprising same | KOREA KUMHO PETROCHEM CO LTD | 2014-05-07 | — | — | CN | disclosed |