SCHEMBL27975303

SCHEMBL27975303

O=C1CCC(=O)N1OS(=O)(=O)c1cccc(F)c1F

nearest known ligand 0.54

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ PARL Q9H300 3/20 0.54
▸ KMT2A Q03164 7/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ AKR1B1 P15121 1/20 0.38
▸ PTGES2 Q9H7Z7 2/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ ALDH1A1 P00352 7/20 0.35
▸ KDM4E B2RXH2 5/20 0.35
▸ MAPT P10636 5/20 0.35
▸ HPGD P15428 3/20 0.35
▸ SMN1; SMN2 Q16637 3/20 0.35
▸ PKM P14618 2/20 0.34
▸ PKLR P30613 2/20 0.34
▸ HTT P42858 3/20 0.33
▸ F2 P00734 3/20 0.33
▸ LMNA P02545 1/20 0.33
▸ VDR P11473 1/20 0.33
▸ MMP2 P08253 1/20 0.33
▸ XBP1 P17861 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3870272 0.76 PARL (0.51) PARLKMT2AMEN1AKR1B1ALDH1A1
SCHEMBL65216 0.75 PARL (0.58) PARLKMT2AMEN1AKR1B1ALDH1A1
SCHEMBL2962362 0.74 PARL (0.62) PARLKMT2AMEN1L3MBTL1ALDH1A1
SCHEMBL452741 0.74 PARL (0.57) PARLKMT2AMEN1ALDH1A1KDM4E
SCHEMBL29369615 0.74 PARL (0.57) PARLKMT2AMEN1ALDH1A1KDM4E
SCHEMBL452440 0.73 PARL (0.70) PARLKMT2AMEN1ALDH1A1KDM4E
SCHEMBL22251627 0.73 PARL (0.76) PARLKMT2AMEN1L3MBTL1ALDH1A1
SCHEMBL2963233 0.73 PARL (0.55) PARLKMT2AMEN1L3MBTL1ALDH1A1
SCHEMBL7973267 0.72 PARL (0.65) PARLKMT2AMEN1AKR1B1ALDH1A1
SCHEMBL7161148 0.72 PARL (0.58) PARLKMT2AMEN1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102213918-B Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor JSR CORP 2014-07-16 — — CN disclosed
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