Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARL | Q9H300 | 2/20 | 0.51 |
| ▸ | PKM | P14618 | 2/20 | 0.45 |
| ▸ | PKLR | P30613 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | F2 | P00734 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16990204 | 0.80 | PARL (0.50) | PARLPKMPKLRPOLBALDH1A1 | |
| SCHEMBL14102451 | 0.78 | ALDH1A1 (0.36) | PKMPKLRPOLBAKR1B1ALDH1A1 | |
| SCHEMBL452440 | 0.78 | PARL (0.70) | PARLPKMALDH1A1KMT2AMEN1 | |
| SCHEMBL15082167 | 0.77 | HTT (0.39) | POLBAKR1B1ALDH1A1KMT2AMEN1 | |
| SCHEMBL6744161 | 0.77 | HTT (0.39) | POLBAKR1B1ALDH1A1KMT2AMEN1 | |
| SCHEMBL10231672 | 0.77 | KMT2A (0.38) | PKMPKLRPOLBAKR1B1ALDH1A1 | |
| SCHEMBL27975303 | 0.76 | PARL (0.54) | PARLPKMPKLRAKR1B1ALDH1A1 | |
| SCHEMBL28292182 | 0.75 | AKR1B1 (0.42) | PKMPKLRPOLBAKR1B1ALDH1A1 | |
| SCHEMBL28211790 | 0.74 | PARL (0.44) | PARLPKMALDH1A1KMT2AMEN1 | |
| SCHEMBL12339094 | 0.73 | PARL (0.81) | PARLALDH1A1KMT2AMEN1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1708728-B | Radiation-sensitive resin composition | JSR CORP | 2011-03-16 | — | — | CN | disclosed |
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| CN-101533224-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2009-09-16 | — | — | CN | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| CN-1708728-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-12-14 | — | — | CN | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |